Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Hybrid Organic/ZnO p-n Junctions with n-Type ZnO Grown by Atomic Layer Deposition

(2016) G. Łuka et al.   ACTA PHYSICA POLONICA A

Characterization of ZnO Films Grown at Low Temperature

(2016) E. Przeździecka et al.   ACTA PHYSICA POLONICA A

ZnO by ALD - Advantages of the Material Grown at Low Temperature

(2016) E. Guziewicz et al.   ACTA PHYSICA POLONICA A

Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology

(2012) Hyungsoon Im et al.   JOURNAL OF MATERIALS RESEARCH

The Surface Chemistry of Atomic Layer Depositions of Solid Thin Films

(2012) Francisco Zaera   Journal of Physical Chemistry Letters

Diffusion phenomena in atomic layer deposition

(2012) Mato Knez   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Atomic-scale simulation of ALD chemistry

(2012) Simon D Elliott   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications

(2012) C Wiemer et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

(2012) J A van Delft et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Tailoring nanoporous materials by atomic layer deposition

(2011) Christophe Detavernier et al.   CHEMICAL SOCIETY REVIEWS

Molybdenum Atomic Layer Deposition Using MoF6and Si2H6as the Reactants

(2011) D. Seghete et al.   CHEMISTRY OF MATERIALS

Atomic layer deposition: state-of-the-art and research/industrial perspectives

(2011) Elia Marin et al.   CORROSION REVIEWS

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

(2011) Riikka L. Puurunen et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Metalcones: Hybrid Organic–Inorganic Films Fabricated Using Atomic and Molecular Layer Deposition Techniques

(2011) Steven M. George et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

(2011) H. B. Profijt et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry

(2011) H. Van Bui et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Influence of organozinc ligand design on growth and material properties of ZnS and ZnO deposited by atomic layer deposition

(2011) Jukka T. Tanskanen et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition for electrochemical energy generation and storage systems

(2011) Qing Peng et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition for nanostructured Li-ion batteries

(2011) H. C. M. Knoops et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Novel materials by atomic layer deposition and molecular layer deposition

(2011) Markku Leskelä et al.   MRS BULLETIN

Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

(2011) W.M.M. (Erwin) Kessels et al.   MRS BULLETIN

ALD for clean energy conversion, utilization, and storage

(2011) Jeffrey W. Elam et al.   MRS BULLETIN

Surface modification and fabrication of 3D nanostructures by atomic layer deposition

(2011) Changdeuck Bae et al.   MRS BULLETIN

Progress and future directions for atomic layer deposition and ALD-based chemistry

(2011) Gregory N. Parsons et al.   MRS BULLETIN

Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition

(2011) Jonathan R. Bakke et al.   Nanoscale

Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

(2011) Jari Malm et al.   THIN SOLID FILMS

Metal Oxide Microrings with Femtoliter Capacity for Raman Microspectroscopy

(2010) Ivano Alessandri et al.   ACS Applied Materials & Interfaces

In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2

(2010) Martin Rose et al.   ACS Applied Materials & Interfaces

Rapid Silica Atomic Layer Deposition on Large Quantities of Cohesive Nanoparticles

(2010) Xinhua Liang et al.   ACS Applied Materials & Interfaces

Transparent, Well-Aligned TiO2 Nanotube Arrays with Controllable Dimensions on Glass Substrates for Photocatalytic Applications

(2010) Lee Kheng Tan et al.   ACS Applied Materials & Interfaces

Protecting Polymers in Space with Atomic Layer Deposition Coatings

(2010) Timothy K. Minton et al.   ACS Applied Materials & Interfaces

Profile Evolution for Conformal Atomic Layer Deposition over Nanotopography

(2010) Erin R. Cleveland et al.   ACS Nano

Synthesis of Nested Coaxial Multiple-Walled Nanotubes by Atomic Layer Deposition

(2010) Diefeng Gu et al.   ACS Nano

Tunable Guided-Mode Resonance Grating Filter

(2010) Adriana Szeghalmi et al.   ADVANCED FUNCTIONAL MATERIALS

Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

(2010) David J. Comstock et al.   ADVANCED FUNCTIONAL MATERIALS

High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation

(2010) Paul Poodt et al.   ADVANCED MATERIALS

Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers

(2010) Qing Peng et al.   ADVANCED MATERIALS

Atomic layer deposition (ALD) as a coating tool for reinforcing fibers

(2010) A. K. Roy et al.   ANALYTICAL AND BIOANALYTICAL CHEMISTRY

Integrated Ultramicroelectrode−Nanopipet Probe for Concurrent Scanning Electrochemical Microscopy and Scanning Ion Conductance Microscopy

(2010) David J. Comstock et al.   ANALYTICAL CHEMISTRY

Low-Temperature ABC-Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles

(2010) Junling Lu et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Optimal preparation of Pt/TiO2 photocatalysts using atomic layer deposition

(2010) Yun Zhou et al.   APPLIED CATALYSIS B-ENVIRONMENTAL

Noble metal-modified TiO2 thin film photocatalyst on porous steel fiber support

(2010) Hongfan Guo et al.   APPLIED CATALYSIS B-ENVIRONMENTAL

Highly dispersed Pt nanoparticle catalyst prepared by atomic layer deposition

(2010) Jianhua Li et al.   APPLIED CATALYSIS B-ENVIRONMENTAL

Effect of gate dielectrics on the device performance of SnO2 nanowire field effect transistors

(2010) Hyun Hee Park et al.   APPLIED PHYSICS LETTERS

The effect of graphite surface condition on the composition of Al2O3 by atomic layer deposition

(2010) A. Pirkle et al.   APPLIED PHYSICS LETTERS

In situ synchrotron x-ray characterization of ZnO atomic layer deposition

(2010) D. D. Fong et al.   APPLIED PHYSICS LETTERS

Low-voltage and short-channel pentacene field-effect transistors with top-contact geometry using parylene-C shadow masks

(2010) Yoonyoung Chung et al.   APPLIED PHYSICS LETTERS

Deterministic tuning of slow-light in photonic-crystal waveguides through the C and L bands by atomic layer deposition

(2010) Charlton J. Chen et al.   APPLIED PHYSICS LETTERS

TiO2-coated carbon nanotubes: A redshift enhanced photocatalysis at visible light

(2010) Sheng-Yi Lu et al.   APPLIED PHYSICS LETTERS

Thickness dependence on crystalline structure and interfacial reactions in HfO2 films on InP (001) grown by atomic layer deposition

(2010) Y. S. Kang et al.   APPLIED PHYSICS LETTERS

Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

(2010) Qian Tao et al.   APPLIED PHYSICS LETTERS

Suppression of substrate oxidation during ozone based atomic layer deposition of Al2O3: Effect of ozone flow rate

(2010) Jinhee Kwon et al.   APPLIED PHYSICS LETTERS

Bilayer metal oxide gate insulators for scaled Ge-channel metal-oxide-semiconductor devices

(2010) Shankar Swaminathan et al.   APPLIED PHYSICS LETTERS

Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

(2010) C. Wiemer et al.   APPLIED PHYSICS LETTERS

Giant dielectric constant dominated by Maxwell–Wagner relaxation in Al2O3/TiO2 nanolaminates synthesized by atomic layer deposition

(2010) Wei Li et al.   APPLIED PHYSICS LETTERS

Origin and passivation of fixed charge in atomic layer deposited aluminum oxide gate insulators on chemically treated InGaAs substrates

(2010) Byungha Shin et al.   APPLIED PHYSICS LETTERS

Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices

(2010) B. Lee et al.   APPLIED PHYSICS LETTERS

Very low surface recombination velocities on p- and n-type c-Si by ultrafast spatial atomic layer deposition of aluminum oxide

(2010) Florian Werner et al.   APPLIED PHYSICS LETTERS

Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

(2010) Brent A. Sperling et al.   APPLIED SURFACE SCIENCE

GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

(2010) M. Bosund et al.   APPLIED SURFACE SCIENCE

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

(2010) Raul Rammula et al.   APPLIED SURFACE SCIENCE

Enhancement of photoluminescence intensity from Si nanodots using Al2O3 surface passivation layer grown by atomic layer deposition

(2010) Edward Sun et al.   APPLIED SURFACE SCIENCE

Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

(2010) A.P. Alekhin et al.   APPLIED SURFACE SCIENCE

Effect of corona pre-treatment on the performance of gas barrier layers applied by atomic layer deposition onto polymer-coated paperboard

(2010) Terhi Hirvikorpi et al.   APPLIED SURFACE SCIENCE

Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium

(2010) S. Abermann et al.   APPLIED SURFACE SCIENCE

Temperature dependence of the sticking coefficient in atomic layer deposition

(2010) M. Rose et al.   APPLIED SURFACE SCIENCE

A bio-originated porous template for the fabrication of very long, inorganic nanotubes and nanowires

(2010) F Mumm et al.   Bioinspiration & Biomimetics

Photocatalytic Decomposition of Toluene Vapor by Bare and TiO2-coated Carbon Fibers

(2010) Yuan Luo et al.   BULLETIN OF THE KOREAN CHEMICAL SOCIETY

Growth and Characterization of Conducting ZnO Thin Films by Atomic Layer Deposition

(2010) Yo-Sep Min et al.   BULLETIN OF THE KOREAN CHEMICAL SOCIETY

Self-assembled Ni/TiO2 nanocomposite anodes synthesized via electroless plating and atomic layer deposition on biological scaffolds

(2010) Konstantinos Gerasopoulos et al.   CHEMICAL COMMUNICATIONS

Mass Analysis of Growth of Al2O3 Thin Films from Low-Temperature Atomic Layer Deposition on Woven Cotton

(2010) Daisuke Hojo et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O

(2010) Christoph Adelmann et al.   CHEMICAL VAPOR DEPOSITION

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Sb2Te3and GeTe from (Et3Si)2Te and Chlorides

(2010) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Subnanoscale Lanthanum Distribution in Lanthanum-Incorporated Hafnium Oxide Thin Films Grown Using Atomic Layer Deposition

(2010) Tuo Wang et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of CdS Films

(2010) Jonathan R. Bakke et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Ru/RuO2Thin Films Studied by In situ Infrared Spectroscopy

(2010) S. K. Park et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition (ALD) Co-Deposited Pt−Ru Binary and Pt Skin Catalysts for Concentrated Methanol Oxidation

(2010) Xirong Jiang et al.   CHEMISTRY OF MATERIALS

Photo-Controlled Wettability Switching by Conformal Coating of Nanoscale Topographies with Ultrathin Oxide Films

(2010) Jari Malm et al.   CHEMISTRY OF MATERIALS

Permittivity Enhanced Atomic Layer Deposited HfO2Thin Films Manipulated by a Rutile TiO2Interlayer

(2010) Minha Seo et al.   CHEMISTRY OF MATERIALS

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition

(2010) Seong Keun Kim et al.   CHEMISTRY OF MATERIALS

Growth of Cu Metal Films at Room Temperature Using Catalyzed Reactions

(2010) Sang-Woo Kang et al.   CHEMISTRY OF MATERIALS

Palladium Catalysts Synthesized by Atomic Layer Deposition for Methanol Decomposition

(2010) Hao Feng et al.   CHEMISTRY OF MATERIALS

Growth of Tantalum(V) Oxide Films by Atomic Layer Deposition Using the Highly Thermally Stable Precursor Ta(NtBu)(iPrNC(Me)NiPr)2(NMe2)

(2010) Monika K. Wiedmann et al.   CHEMISTRY OF MATERIALS

Low Temperature Atomic Layer Deposition of Tin Oxide

(2010) Jaeyeong Heo et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Ir−Pt Alloy Films

(2010) Steven T. Christensen et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony

(2010) Viljami Pore et al.   CHEMISTRY OF MATERIALS

Molecular Mechanisms of Aluminum Oxide Thin Film Growth on Polystyrene during Atomic Layer Deposition

(2010) Manjunath Puttaswamy et al.   CHEMISTRY-A EUROPEAN JOURNAL

Epitaxial Growth ofm-Plane ZnO Thin Films on (101̅0) Sapphire Substrate by Atomic Layer Deposition with Interrupted Flow

(2010) Ching-Shun Ku et al.   CRYSTAL GROWTH & DESIGN

Study of bismuth alkoxides as possible precursors for ALD

(2010) Timo Hatanpää et al.   DALTON TRANSACTIONS

Enhancement of Photoelectrochemical Properties of ALD TiO[sub 2] Films by Light-Trapping Effect

(2010) Hsyi-En Cheng et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

(2010) S. J. Lim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Advantageous Reverse Recovery Behavior of Pentacene/ZnO Diode

(2010) Kwang H. Lee et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Reduced Metal Contamination in Atomic-Layer-Deposited HfO[sub 2] Films Grown on Si Using O[sub 3] Oxidant Generated Without N[sub 2] Assistance

(2010) Tae Joo Park et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Selective Incorporation of Colloidal Nanocrystals in Nanopatterned SiO[sub 2] Layer for Nanocrystal Memory Device

(2010) Il Seo et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of N[sub 2]/O[sub 2] Supply Ratio in Ozone Generation

(2010) Annelies Delabie et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Low Temperature Epitaxial Growth of High Permittivity Rutile TiO[sub 2] on SnO[sub 2]

(2010) Hongtao Wang et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Plasma-Enhanced Atomic Layer Deposition of TaC[sub x]N[sub y] Films with tert-Butylimido Tris-diethylamido Tantalum and Methane/Hydrogen Gas

(2010) Gi-hee Cho et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Investigation of Thermal Stability of Atomic-Layer-Deposited MgO Thin Films on Si(100) Using X-Ray Photoelectron Spectroscopy

(2010) Hong-Liang Lu et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Synthesis of nanoporous activated iridium oxide films by anodized aluminum oxide templated atomic layer deposition

(2010) David J. Comstock et al.   ELECTROCHEMISTRY COMMUNICATIONS

Low-temperature atomic layer deposited Al2O3 thin film on layer structure cathode for enhanced cycleability in lithium-ion batteries

(2010) Jyh-Tsung Lee et al.   ELECTROCHIMICA ACTA

Effects of Initial Growth Mode on the Electrical Properties of Atomic-Layer-deposited HfO2 Films

(2010) Hyo Sik Chang   Electronic Materials Letters

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

(2010) Seok-Jun Won et al.   IEEE ELECTRON DEVICE LETTERS

UV Electroluminescence and Structure of n-ZnO/p-GaN Heterojunction LEDs Grown by Atomic Layer Deposition

(2010) Hsing-Chao Chen et al.   IEEE JOURNAL OF QUANTUM ELECTRONICS

Liquid Core ARROW Waveguides by Atomic Layer Deposition

(2010) Genni Testa et al.   IEEE PHOTONICS TECHNOLOGY LETTERS

Synthesis of Photoactive Magnetic Nanoparticles with Atomic Layer Deposition†

(2010) Yun Zhou et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

A Family of Heteroleptic Titanium Guanidinates: Synthesis, Thermolysis, and Surface Reactivity

(2010) Yamile A. Wasslen et al.   INORGANIC CHEMISTRY

Growth and properties of Al2O3 and SiO2 nanolayers on III–V semiconductors

(2010) Yu. K. Ezhovskii et al.   INORGANIC MATERIALS

Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation

(2010) Byung-Woo Kang et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Plasma-Enhanced Atomic Layer Deposition of Ni

(2010) Han-Bo-Ram Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

(2010) Jae-Min Kim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH2Cl2and O3

(2010) Won-Jun Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor

(2010) Tatsunori Murata et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Investigation of Thermal Stability of TiN Film Formed by Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium Precursor for Metal-Gate Metal–Oxide–Semiconductor Field-Effect Transistor

(2010) Tetsuro Hayashida et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Growth of ZnSe(1−x)Tex epilayers by isothermal closed space sublimation

(2010) Erick M. Larramendi et al.   JOURNAL OF APPLIED PHYSICS

Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators

(2010) P. S. Waggoner et al.   JOURNAL OF APPLIED PHYSICS

Resistance switching in HfO2 metal-insulator-metal devices

(2010) P. Gonon et al.   JOURNAL OF APPLIED PHYSICS

O3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates

(2010) L. Lamagna et al.   JOURNAL OF APPLIED PHYSICS

Complete band offset characterization of the HfO2/SiO2/Si stack using charge corrected x-ray photoelectron spectroscopy

(2010) E. Bersch et al.   JOURNAL OF APPLIED PHYSICS

Nonvolatile memory characteristics of atomic layer deposited Ru nanocrystals with a SiO2/Al2O3 bilayered tunnel barrier

(2010) Do-Joong Lee et al.   JOURNAL OF APPLIED PHYSICS

Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

(2010) A. J. M. Mackus et al.   JOURNAL OF APPLIED PHYSICS

Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

(2010) D. Hiller et al.   JOURNAL OF APPLIED PHYSICS

The properties of tris (8-hydroxyquinoline) aluminum organic light emitting diode with undoped zinc oxide anode layer

(2010) G. Luka et al.   JOURNAL OF APPLIED PHYSICS

On the isothermal closed space sublimation growth of CdSe using a mixed source for selenium

(2010) Erick M. Larramendi et al.   JOURNAL OF CRYSTAL GROWTH

Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition

(2010) Han-Bo-Ram Lee et al.   JOURNAL OF CRYSTAL GROWTH

XPS and depth resolved SXES study of HfO2/Si interlayers

(2010) E.O. Filatova et al.   JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA

(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium

(2010) Jani Hämäläinen et al.   JOURNAL OF MATERIALS CHEMISTRY

Rare earth scandate thin films by atomic layer deposition: effect of the rare earth cation size

(2010) Pia Myllymäki et al.   JOURNAL OF MATERIALS CHEMISTRY

Low-temperature synthesis of nanoscale silica multilayers – atomic layer deposition in a test tube

(2010) Benjamin Hatton et al.   JOURNAL OF MATERIALS CHEMISTRY

Lanthanum titanate and lithium lanthanum titanate thin films grown by atomic layer deposition

(2010) Titta Aaltonen et al.   JOURNAL OF MATERIALS CHEMISTRY

Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers

(2010) Joseph C. Spagnola et al.   JOURNAL OF MATERIALS CHEMISTRY

Cubic phase stabilization and improved dielectric properties of atomic-layer-deposited Er yHf1-yO x thin films

(2010) K.B. Jinesh et al.   JOURNAL OF MATERIALS RESEARCH

Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition

(2010) Yongchan Kim et al.   JOURNAL OF MATERIALS RESEARCH

Structure and photoluminescence properties of ZnS nanowires sheathed with SnO2 by atomic layer deposition

(2010) Kyungjoon Baek et al.   JOURNAL OF MATERIALS SCIENCE

Infrared and near-infrared spectroscopic probing of atomic layer deposition processes

(2010) A. O’Mahony et al.   JOURNAL OF MOLECULAR STRUCTURE

Fabrication Process of Carbon Nanotube Field Effect Transistors Using Atomic Layer Deposition Passivation for Biosensors

(2010) Yasuhiro Nakashima et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

In Situ Analysis of Dopant Incorporation, Activation, and Film Growth during Thin Film ZnO and ZnO:Al Atomic Layer Deposition

(2010) Jeong-Seok Na et al.   Journal of Physical Chemistry C

Coverage Analysis for the Core/Shell Electrode of Dye-Sensitized Solar Cells

(2010) Ta-Chang Tien et al.   Journal of Physical Chemistry C

Theoretical and Experimental Analysis of the Sensitivity of Guided Mode Resonance Sensors

(2010) Adriana Szeghalmi et al.   Journal of Physical Chemistry C

Shrinking Core Model for Knudsen Diffusion-Limited Atomic Layer Deposition on a Nanoporous Monolith with an Ultrahigh Aspect Ratio

(2010) Hoo-Yong Lee et al.   Journal of Physical Chemistry C

Non-Aqueous Approach to Synthesize Amorphous/Crystalline Metal Oxide-Graphene Nanosheet Hybrid Composites

(2010) Xiangbo Meng et al.   Journal of Physical Chemistry C

Kinetics of Stop-Flow Atomic Layer Deposition for High Aspect Ratio Template Filling through Photonic Band Gap Measurements

(2010) Siva Krishna Karuturi et al.   Journal of Physical Chemistry C

Comparative Study of Titanium Dioxide Atomic Layer Deposition on Silicon Dioxide and Hydrogen-Terminated Silicon

(2010) Rungthiwa Methaapanon et al.   Journal of Physical Chemistry C

Tetrakis(dimethylamido)hafnium Adsorption and Reaction on Hydrogen Terminated Si(100) Surfaces

(2010) Kejing Li et al.   Journal of Physical Chemistry C

Space-Limited Crystal Growth Mechanism of TiO2 Films by Atomic Layer Deposition

(2010) Wen-Jen Lee et al.   Journal of Physical Chemistry C

In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion

(2010) Shaibal K. Sarkar et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel

(2010) Jeffrey W. Elam et al.   Journal of Physical Chemistry C

Structure and Disorder in Amorphous Alumina Thin Films: Insights from High-Resolution Solid-State NMR

(2010) Sung Keun Lee et al.   Journal of Physical Chemistry C

Genesis and Evolution of Surface Species during Pt Atomic Layer Deposition on Oxide Supports Characterized by in Situ XAFS Analysis and Water−Gas Shift Reaction

(2010) Worajit Setthapun et al.   Journal of Physical Chemistry C

Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide

(2010) Jay Yu Kim et al.   Journal of Physical Chemistry C

Surface Modification of SnO2 Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al2O3 Atomic Layer Deposition

(2010) Chaiya Prasittichai et al.   Journal of Physical Chemistry Letters

The effects of RF power on the interfacial property between Al2O3and Si3N4and on the memory property in a MANOS structure

(2010) Hyungchul Kim et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Electronic and optical properties of Al2O3/SiO2thin films grown on Si substrate

(2010) Dahlang Tahir et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Angular behavior of the Berreman effect investigated in uniform Al2O3layers formed by atomic layer deposition

(2010) Giovanna Scarel et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Novel TiO2/ZnO multilayer mirrors at ‘water-window’ wavelengths fabricated by atomic layer epitaxy

(2010) H Kumagai et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Improved performance of dye-sensitized solar cells with TiO2/alumina core–shell formation using atomic layer deposition

(2010) V. Ganapathy et al.   JOURNAL OF POWER SOURCES

Atomic layer deposition of titanium dioxide thin films from tetraethoxytitanium and water

(2010) A. P. Alekhin et al.   Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques

The Transition between Conformal Atomic Layer Epitaxy and Nanowire Growth

(2010) Ren Bin Yang et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Ni(III)/(IV) Bis(dicarbollide) as a Fast, Noncorrosive Redox Shuttle for Dye-Sensitized Solar Cells

(2010) Tina C. Li et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic Layer Deposition of Ta–N-Based Thin Films Using a Tantalum Source

(2010) D. Schmidt et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum

(2010) Suk-Hoon Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Stimulated Emission in Highly (0001)-Oriented ZnO Films Grown by Atomic Layer Deposition on the Amorphous Glass Substrates

(2010) Y. T. Shih et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Preparation of Pt/SnO[sub 2] Core–Shell Nanowires with Enhanced Ethanol Gas- and Photon-Sensing Properties

(2010) Yu-Hung Lin et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Investigation of ZrO[sub 2]–Gd[sub 2]O[sub 3] Based High-k Materials as Capacitor Dielectrics

(2010) Indrek Jõgi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Fabrication and Characteristics of Self-Aligned ZnO Nanotube and Nanorod Arrays on Si Substrates by Atomic Layer Deposition

(2010) Yung-Huang Chang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Tunable Work-Function Engineering of TiC–TiN Compound by Atomic Layer Deposition for Metal Gate Applications

(2010) Sanghun Jeon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Growth and Interface Evolution of HfO[sub 2] Films on GaAs(100) Surfaces

(2010) Theodosia Gougousi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Fabrication of Robust Triple-Ti[sub 1−x]Al[sub x]N Metal Gate by Atomic Layer Deposition

(2010) Sanghun Jeon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaN[sub x] on Adhesion with Copper

(2010) Chih-Chieh Chang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Platinum Nanoparticles Grown by Atomic Layer Deposition for Charge Storage Memory Applications

(2010) Steven Novak et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Electrical and Bias Temperature Instability Characteristics of n-Type Field-Effect Transistors Using HfO[sub x]N[sub y] Gate Dielectrics

(2010) Hyung-Suk Jung et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H[sub 2]O Process

(2010) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer

(2010) Marja N. Mullings et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

The Effects of Annealing Ambient on the Characteristics of La[sub 2]O[sub 3] Films Deposited by RPALD

(2010) Hyungchul Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Catalysts with Pt Surface Coating by Atomic Layer Deposition for Solid Oxide Fuel Cells

(2010) Joon Hyung Shim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition ZnO:N Thin Film Transistor: The Effects of N Concentration on the Device Properties

(2010) S. J. Lim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

(2010) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

?The Degradation of Deposition Blocking Layer during Area Selective Plasma Enhanced Atomic Layer Deposition of Cobalt

(2010) Hyungjun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Investigating the TiN Film Quality and Growth Behavior for Plasma-enhanced Atomic Layer Deposition Using TiCl$_4$ and N$_2$/H$_2$/Ar Radicals

(2010) Jin-seong Park et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Multiferroic Properties of Bismuth Layer Structured Bi3.25La0.75Ti3O12-(La0.7 Sr0.3)MnO3 Solid Solution at Low Temperature

(2010) Jeong Seog Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Surface texture and wetting stability of polydimethylsiloxane coated with aluminum oxide at low temperature by atomic layer deposition

(2010) Joseph C. Spagnola et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Time-resolved Fourier transform infrared spectroscopy of the gas phase during atomic layer deposition

(2010) Brent A. Sperling et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers

(2010) Jesse S. Jur et al.   LANGMUIR

Nano/Subnanometer Pd Nanoparticles on Oxide Supports Synthesized by AB-type and Low-Temperature ABC-type Atomic Layer Deposition: Growth and Morphology†

(2010) Junling Lu et al.   LANGMUIR

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

GaN Nanowire Functionalized with Atomic Layer Deposition Techniques for Enhanced Immobilization of Biomolecules

(2010) D. J. Guo et al.   LANGMUIR

Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide

(2010) Min Dai et al.   LANGMUIR

Area-Selective Atomic Layer Deposition of Lead Sulfide: Nanoscale Patterning and DFT Simulations

(2010) Wonyoung Lee et al.   LANGMUIR

Epitaxial growth of ZnO films at extremely low temperature by atomic layer deposition with interrupted flow

(2010) Ching-Shun Ku et al.   MATERIALS CHEMISTRY AND PHYSICS

Structure and Electro-Optical Properties of Thin Films Grown by Alternate Atomic Layer Deposition of ZnO and Al2O3 on the Sapphire Substrate

(2010) Miran \\v{C}eh et al.   MATERIALS TRANSACTIONS

Fabrication of ZnO Nanopillars by Atomic Layer Deposition

(2010) Mong-Kai Wu et al.   MATERIALS TRANSACTIONS

Effects of defects generated in ALD TiO2 films on electrical properties and interfacial reaction in TiO2/SiO2/Si system upon annealing in vacuum

(2010) Sanghee Won et al.   METALS AND MATERIALS INTERNATIONAL

Supported Ru−Pt Bimetallic Nanoparticle Catalysts Prepared by Atomic Layer Deposition

(2010) Steven T. Christensen et al.   NANO LETTERS

Sub-10-nm Nanochannels by Self-Sealing and Self-Limiting Atomic Layer Deposition

(2010) Sung-Wook Nam et al.   NANO LETTERS

Multi-Directional Growth of Aligned Carbon Nanotubes Over Catalyst Film Prepared by Atomic Layer Deposition

(2010) Kai Zhou et al.   Nanoscale Research Letters

Atomic Layer Deposition of ZnO on Multi-walled Carbon Nanotubes and Its Use for Synthesis of CNT–ZnO Heterostructures

(2010) X. L. Li et al.   Nanoscale Research Letters

SnO2nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance

(2010) Won-Sik Kim et al.   NANOTECHNOLOGY

A synthesis and sensing application of hollow ZnO nanofibers with uniform wall thicknesses grown using polymer templates

(2010) Jae Young Park et al.   NANOTECHNOLOGY

Biofabrication methods for the patterned assembly and synthesis of viral nanotemplates

(2010) K Gerasopoulos et al.   NANOTECHNOLOGY

Peptide-templating dye-sensitized solar cells

(2010) Tae Hee Han et al.   NANOTECHNOLOGY

Scanning tunneling spectroscopy of lead sulfide quantum wells fabricated by atomic layer deposition

(2010) Wonyoung Lee et al.   NANOTECHNOLOGY

Enhanced visible photoluminescence from ultrathin ZnO films grown on Si-nanowires by atomic layer deposition

(2010) Yuan-Ming Chang et al.   NANOTECHNOLOGY

CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns

(2010) G Gay et al.   NANOTECHNOLOGY

Nanoporous gold–alumina core–shell films with tunable optical properties

(2010) Lihua Qian et al.   NANOTECHNOLOGY

Liquid injection atomic layer deposition of silver nanoparticles

(2010) P R Chalker et al.   NANOTECHNOLOGY

Change in carrier type in high-kgate carbon nanotube field-effect transistors by interface fixed charges

(2010) N Moriyama et al.   NANOTECHNOLOGY

Direct probe of heterojunction effects upon photoconductive properties of TiO2nanotubes fabricated by atomic layer deposition

(2010) Yung-Huang Chang et al.   NANOTECHNOLOGY

Encapsulation of organic solar cells with ultrathin barrier layers deposited by ozone-based atomic layer deposition

(2010) Smita Sarkar et al.   ORGANIC ELECTRONICS

Atomic layer deposition-based functionalization of materials for medical and environmental health applications

(2010) R. J. Narayan et al.   PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES

A comparative study of the photoluminescence and conduction mechanisms of low temperature pulsed laser deposited and atomic layer deposited zinc oxide thin films

(2010) Fang Ling Kuo et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Transparent and conductive undoped zinc oxide thin films grown by atomic layer deposition

(2010) Grzegorz Luka et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition

(2010) Seungjun Lee et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Comparison of dimethylzinc and diethylzinc as precursors for monocrystalline zinc oxide grown by atomic layer deposition method

(2010) L. Wachnicki et al.   PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS

Zinc oxide grown by atomic layer deposition - a material for novel 3D electronics

(2010) Elżbieta Guziewicz et al.   PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS

Tubular magnetic nanostructures based on glancing angle deposited templates and atomic layer deposition

(2010) Ole Albrecht et al.   PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS

Bipolar resistive switching in amorphous titanium oxide thin film

(2010) Hu Young Jeong et al.   Physica Status Solidi-Rapid Research Letters

Structural properties and electronic structure ofHfO2-ZrO2composite films

(2010) Deok-Yong Cho et al.   PHYSICAL REVIEW B

The effect exerted by temperature on the phase formation of titanium oxide layer on silica surface at different stages of molecular layering

(2010) A. A. Malkov et al.   RUSSIAN JOURNAL OF APPLIED CHEMISTRY

The preparation and properties of chromium oxide nanolayers on semiconducting matrices

(2010) Yu. K. Ezhovskii et al.   Russian Journal of Physical Chemistry A

Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application

(2010) J Hinz et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Downscaling of defect-passivated Gd2O3thin films on p-Si(0 0 1) wafers grown by H2O-assisted atomic layer deposition

(2010) R Ranjith et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

(2010) M. Laamanen et al.   SENSORS AND ACTUATORS A-PHYSICAL

Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

(2010) Antti J. Niskanen et al.   SENSORS AND ACTUATORS B-CHEMICAL

Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations

(2010) Dai Hong Kim et al.   SENSORS AND ACTUATORS B-CHEMICAL

Flexible Replication Technique for High-Aspect-Ratio Nanostructures

(2010) Adriana Szeghalmi et al.   Small

Preparation and Elastic Properties of Helical Nanotubes Obtained by Atomic Layer Deposition with Carbon Nanocoils as Templates

(2010) Yong Qin et al.   Small

Electronic structure and optical properties of Nb doped Al2O3 on Si by atomic layer deposition

(2010) Yan Xu et al.   SOLID STATE COMMUNICATIONS

Influence of coating and thermal annealing on the structure and luminescence properties of CuO nanorods

(2010) Changhyun Jin et al.   SOLID STATE COMMUNICATIONS

Atomic layer deposited high-k nanolaminate capacitors

(2010) S.W. Smith et al.   SOLID-STATE ELECTRONICS

Growth and stability of CVD Ni3N and ALD NiO dual layers

(2010) Erik Lindahl et al.   SURFACE & COATINGS TECHNOLOGY

Influence of active layer thickness and annealing in zinc oxide TFT grown by atomic layer deposition

(2010) Cheol Hyoun Ahn et al.   SURFACE AND INTERFACE ANALYSIS

X-ray spectroscopic examination of thin HfO2 films ALD- and MOCVD-grown on the Si(100) surface

(2010) A. A. Sokolov et al.   TECHNICAL PHYSICS

Effect of Weave Geometry on Surface Energy Modification of Textile Materials via Atomic Layer Deposition

(2010) Kelly M. Roth et al.   TEXTILE RESEARCH JOURNAL

Self-limiting growth of anatase TiO2: A comparison of two deposition techniques

(2010) Nicholas G. Kubala et al.   THIN SOLID FILMS

Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

(2010) Chang-Soo Lee et al.   THIN SOLID FILMS

UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

(2010) Byoung H. Lee et al.   THIN SOLID FILMS

Improved properties of Pt–HfO2 gate insulator–ZnO semiconductor thin film structure by annealing of ZnO layer

(2010) Kwang Duk Na et al.   THIN SOLID FILMS

Structure and property changes of ZrO2/Al2O3/ZrO2 laminate induced by low-temperature NH3 annealing applicable to metal–insulator–metal capacitor

(2010) Ming-Yen Li et al.   THIN SOLID FILMS

Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

(2010) F. Hirose et al.   THIN SOLID FILMS

Atomic layer deposition of tantalum nitride based thin films from cyclopentadienyl type precursor

(2010) A. Correia Anacleto et al.   THIN SOLID FILMS

Atomic layer deposition and characterization of zirconium oxide–erbium oxide nanolaminates

(2010) Aile Tamm et al.   THIN SOLID FILMS

Atomic layer deposition of ZnS via in situ production of H2S

(2010) J.R. Bakke et al.   THIN SOLID FILMS

Deposited dielectrics on metal thin films using silicon and glass substrates for hot electron-induced electrochemiluminescence

(2010) Antti J. Niskanen et al.   THIN SOLID FILMS

Low-loss optical waveguides for the near ultra-violet and visible spectral regions with Al2O3 thin films from atomic layer deposition

(2010) Mustafa M. Aslan et al.   THIN SOLID FILMS

Structure and stimulated emission of a high-quality zinc oxide epilayer grown by atomic layer deposition on the sapphire substrate

(2010) H.C. Chen et al.   THIN SOLID FILMS

Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

(2010) Woo-Hee Kim et al.   THIN SOLID FILMS

Comparison of some coating techniques to fabricate barrier layers on packaging materials

(2010) Terhi Hirvikorpi et al.   THIN SOLID FILMS

Biocompatible Interface Films Deposited within Porous Polymers by Atomic Layer Deposition (ALD)

(2009) Xinhua Liang et al.   ACS Applied Materials & Interfaces

Bi-directional Kirkendall Effect in Coaxial Microtube Nanolaminate Assemblies Fabricated by Atomic Layer Deposition

(2009) Qing Peng et al.   ACS Nano

Controlled Introduction of Diameter Modulations in Arrayed Magnetic Iron Oxide Nanotubes

(2009) Kristina Pitzschel et al.   ACS Nano

Fabrication and Electrochemical Characterization of TiO2 Three-Dimensional Nanonetwork Based on Peptide Assembly

(2009) Sung-Wook Kim et al.   ACS Nano

Biotemplated Hierarchical Nanostructure of Layered Double Hydroxides with Improved Photocatalysis Performance

(2009) Yufei Zhao et al.   ACS Nano

Surface Polarity Shielding and Hierarchical ZnO Nano-Architectures Produced Using Sequential Hydrothermal Crystal Synthesis and Thin Film Atomic Layer Deposition

(2009) Jeong-Seok Na et al.   ACS Nano

Multitwinned Spinel Nanowires by Assembly of Nanobricks via Oriented Attachment: A Case Study of Zn2TiO4

(2009) Yang Yang et al.   ACS Nano

In-Situ Studies of ALD Growth of Hafnium Oxide Films

(2009) Konstantin Karavaev et al.   ADVANCED ENGINEERING MATERIALS

Atomic Layer Deposition of High-kOxides of the Group 4 Metals for Memory Applications

(2009) Jaakko Niinistö et al.   ADVANCED ENGINEERING MATERIALS

Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors

(2009) Yong Wang et al.   ADVANCED MATERIALS

Al2O3/ZrO2Nanolaminates as Ultrahigh Gas-Diffusion Barriers-A Strategy for Reliable Encapsulation of Organic Electronics

(2009) Jens Meyer et al.   ADVANCED MATERIALS

Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

(2009) Byoung H. Lee et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

The interaction of cobalt species with alumina on Co/Al2O3 catalysts prepared by atomic layer deposition

(2009) L.B. Backman et al.   APPLIED CATALYSIS A-GENERAL

Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition

(2009) Chang-Soo Lee et al.   APPLIED CATALYSIS B-ENVIRONMENTAL

Influence of oxygen depletion layer on the properties of tin oxide gas-sensing films fabricated by atomic layer deposition

(2009) Gomathi Natarajan et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Enhancing the nucleation of palladium atomic layer deposition on Al2O3 using trimethylaluminum to prevent surface poisoning by reaction products

(2009) D. N. Goldstein et al.   APPLIED PHYSICS LETTERS

Hafnium oxide/germanium oxynitride gate stacks on germanium: Capacitance scaling and interface state density

(2009) Yasuhiro Oshima et al.   APPLIED PHYSICS LETTERS

Gate-defined quantum-dot devices realized in InGaAs/InP by incorporating a HfO2 layer as gate dielectric

(2009) Jie Sun et al.   APPLIED PHYSICS LETTERS

Impact of high-k TiOx dielectric on device performance of indium-gallium-zinc oxide transistors

(2009) Jin-Seong Park et al.   APPLIED PHYSICS LETTERS

Replicated photonic crystals by atomic layer deposition within holographically defined polymer templates

(2009) E. Graugnard et al.   APPLIED PHYSICS LETTERS

Low-voltage pentacene organic field-effect transistors with high-κ HfO2 gate dielectrics and high stability under bias stress

(2009) Xiao-Hong Zhang et al.   APPLIED PHYSICS LETTERS

Vertical alignment of liquid crystals on a fully oxidized HfO2 surface by ion bombardment

(2009) Won-Kyu Lee et al.   APPLIED PHYSICS LETTERS

A hybrid encapsulation method for organic electronics

(2009) N. Kim et al.   APPLIED PHYSICS LETTERS

Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

(2009) W. M. M. Kessels et al.   APPLIED PHYSICS LETTERS

Atomic layer deposition of Cu2S for future application in photovoltaics

(2009) Alex B. F. Martinson et al.   APPLIED PHYSICS LETTERS

Low-voltage InGaZnO thin-film transistors with Al2O3 gate insulator grown by atomic layer deposition

(2009) J. B. Kim et al.   APPLIED PHYSICS LETTERS

Photonic bandgap engineering with inverse opal multistacks of different refractive index contrasts

(2009) Dae-Kue Hwang et al.   APPLIED PHYSICS LETTERS

Improved two-dimensional electron gas transport characteristics in AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor with atomic layer-deposited Al2O3 as gate insulator

(2009) Z. H. Liu et al.   APPLIED PHYSICS LETTERS

Realization of a high mobility dual-gated graphene field-effect transistor with Al2O3 dielectric

(2009) Seyoung Kim et al.   APPLIED PHYSICS LETTERS

Effect of modification of S-terminated Ge(100) surface on ALD HfO2 gate stack

(2009) Younghwan Lee et al.   APPLIED SURFACE SCIENCE

Self-limiting growth of ZnO films on (0001) sapphire substrates by atomic layer deposition at low temperatures using diethyl-zinc and nitrous oxide

(2009) Yen-Ting Lin et al.   APPLIED SURFACE SCIENCE

Atomic layer deposition of ytterbium oxide using -diketonate and ozone precursors

(2009) M. Bosund et al.   APPLIED SURFACE SCIENCE

Study of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k oxides by attenuated total reflectance infrared spectroscopy

(2009) A. Hardy et al.   APPLIED SURFACE SCIENCE

Method to determine the sticking coefficient of precursor molecules in atomic layer deposition

(2009) M. Rose et al.   APPLIED SURFACE SCIENCE

Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates

(2009) G K Hyde et al.   Biomedical Materials

Beta Zeolite-Supported Iridium Catalysts by Gas Phase Deposition

(2009) H. Vuori et al.   CATALYSIS LETTERS

Alumina coating of ultrafine nanoporous gold at room temperature and their optical properties

(2009) Lihua Qian et al.   CHEMICAL PHYSICS LETTERS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Etching of Nb2O5Thin Films by NbCl5

(2009) Kjell Knapas et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of NiO by the Ni(thd)2/H2O Precursor Combination

(2009) Erik Lindahl et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Ta2O5/Polyimide Nanolaminates

(2009) Leo D. Salmi et al.   CHEMICAL VAPOR DEPOSITION

Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

(2009) Renske Beetstra et al.   CHEMICAL VAPOR DEPOSITION

Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc

(2009) Pieter C. Rowlette et al.   CHEMICAL VAPOR DEPOSITION

ALD of YF3Thin Films from TiF4and Y(thd)3Precursors

(2009) Tero Pilvi et al.   CHEMICAL VAPOR DEPOSITION

Large-Scale Synthesis of Few-Layered Graphene using CVD

(2009) Xianbao Wang et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide

(2009) Ren Bin Yang et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition Growth of BaB2O4Thin Films from an Exceptionally Thermally Stable Tris(pyrazolyl)borate-Based Precursor

(2009) Mark J. Saly et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Ruthenium Nanoparticles Using a Low-Density Dielectric Film as Template Structure

(2009) Jaeyeong Heo et al.   CHEMISTRY OF MATERIALS

The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2Thin Films

(2009) Seok-Jun Won et al.   CHEMISTRY OF MATERIALS

Nanoscale Structure and Morphology of Atomic Layer Deposition Platinum on SrTiO3(001)

(2009) Steven T. Christensen et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps

(2009) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Role of Gas Doping Sequence in Surface Reactions and Dopant Incorporation during Atomic Layer Deposition of Al-Doped ZnO

(2009) Jeong-Seok Na et al.   CHEMISTRY OF MATERIALS

Controlling Atomic Layer Deposition of TiO2in Aerogels through Surface Functionalization

(2009) Sutapa Ghosal et al.   CHEMISTRY OF MATERIALS

Intermediate-Temperature Ceramic Fuel Cells with Thin Film Yttrium-Doped Barium Zirconate Electrolytes

(2009) Joon Hyung Shim et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Lead Sulfide Thin Films for Quantum Confinement

(2009) Neil P. Dasgupta et al.   CHEMISTRY OF MATERIALS

Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces

(2009) Qiang Ma et al.   CHEMISTRY OF MATERIALS

Iron(III)-oxo Centers on TiO2for Visible-Light Photocatalysis

(2009) Joseph A. Libera et al.   CHEMISTRY OF MATERIALS

Explosive Crystallization in Atomic Layer Deposited Mixed Titanium Oxides

(2009) Viljami Pore et al.   CRYSTAL GROWTH & DESIGN

Growing ZnO Nanocrystals on Polystyrene Nanospheres by Extra-Low-Temperature Atomic Layer Deposition

(2009) I. Alessandri et al.   CRYSTAL GROWTH & DESIGN

Structural Characteristics and Annealing Effect of ZnO Epitaxial Films Grown by Atomic Layer Deposition

(2009) S. Yang et al.   CRYSTAL GROWTH & DESIGN

Crystal Phase Evolution in Quantum Confined ZnO Domains on Particles via Atomic Layer Deposition

(2009) David M. King et al.   CRYSTAL GROWTH & DESIGN

Preparation, structure, and photoluminescence properties of Ga2O3/SnO2coaxial nanowires

(2009) Changhyun Jin et al.   CRYSTAL RESEARCH AND TECHNOLOGY

Luminescent properties of BaMgAl10O17:Eu2+ blue phosphor grown with SiO2 using atomic layer deposition

(2009) Young Kyu Jeong et al.   CURRENT APPLIED PHYSICS

Effects of O2 plasma pre-treatment on ZnO thin films grown on polyethersulfone substrates at various deposition temperatures by atomic layer deposition

(2009) J.Y. Lee et al.   CURRENT APPLIED PHYSICS

Effect of poly silicon thickness on the formation of Ni-FUSI gate by using atomic layer deposited nickel film

(2009) Jong-Bong Ha et al.   CURRENT APPLIED PHYSICS

Micro-Raman investigation of vanadium-oxide coated tubular carbon nanofibers for gas-sensing applications

(2009) S. Santangelo et al.   DIAMOND AND RELATED MATERIALS

Enhancement of the TiO[sub 2] Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate

(2009) Dae-Kwon Joo et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Photoluminescence of GaQ[sub 3]–Al[sub 2]O[sub 3] Core-Shell Nanowires

(2009) Chih-Chieh Wang et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

High Efficiency Silicon Solar Cells with Bilayer Passivation Structure

(2009) W. C. Sun et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic Layer Deposition of ZrO[sub 2] and HfO[sub 2] Nanotubes by Template Replication

(2009) Diefeng Gu et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Remote Plasma ALD of Platinum and Platinum Oxide Films

(2009) H. C. M. Knoops et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Composition–Structure–Dielectric Property of Yttrium-Doped Hafnium Oxide Films Deposited by Atomic Layer Deposition

(2009) Qian Tao et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2]

(2009) Tae-Kwang Eom et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N[sub 2]O Gas

(2009) Seok-Jun Won et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic layer deposition of TiO2 nanotubes and its improved electrostatic capacitance

(2009) Jongmin Lee et al.   ELECTROCHEMISTRY COMMUNICATIONS

Fabrication and Properties of AlN Film on GaN Substrate by Using Remote Plasma Atomic Layer Deposition Method

(2009) Kwang-Ho Kim et al.   Electronic Materials Letters

Enhanced Chemical Vapor Deposition of Pt Films on UV-exposed TiO2 Surfaces

(2009) Ara Kim et al.   Electronic Materials Letters

Current collapse reduction in InAlN/GaN MOS HEMTs by in situ surface pre-treatment and atomic layer deposition of ZrO2 high-k gate dielectrics

(2009) S. Abermann et al.   ELECTRONICS LETTERS

Optical and Electrical Properties of Ti<SUB>x</SUB>Si<SUB>1-x</SUB>O<SUB>y</SUB> Films

(2009) Jung Wook Lim et al.   ETRI JOURNAL

Fast PEALD ZnO Thin-Film Transistor Circuits

(2009) Devin A. Mourey et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Bis(cyclopentadienyl) zirconium(IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD

(2009) Stephen E. Potts et al.   INORGANICA CHIMICA ACTA

Comparison of Tantalum Nitride Films for Different NH3/H2/Ar Reactant States in Two-Step Atomic Layer Deposition

(2009) Jung-Dae Kwon et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Atomic Layer Deposition of HfO2onto Si Using Hf(NMe2)4

(2009) Jeong Chan Kim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Atomic layer deposition of TiO2 thin films on nanoporous alumina templates: Medical applications

(2009) Roger J. Narayan et al.   JOM

Template-based multiwalled TiO2/iron oxides nanotubes: Structure and magnetic properties

(2009) I. L. Soroka et al.   JOURNAL OF APPLIED PHYSICS

Atomically abrupt and unpinned Al2O3/In0.53Ga0.47As interfaces: Experiment and simulation

(2009) Eun Ji Kim et al.   JOURNAL OF APPLIED PHYSICS

Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers

(2009) W. Weinreich et al.   JOURNAL OF APPLIED PHYSICS

Size-dependent polymorphism in HfO2 nanotubes and nanoscale thin films

(2009) Michael Shandalov et al.   JOURNAL OF APPLIED PHYSICS

Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications

(2009) D. Hoogeland et al.   JOURNAL OF APPLIED PHYSICS

Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3

(2009) R. W. Wind et al.   JOURNAL OF APPLIED PHYSICS

Size effects in ordered arrays of magnetic nanotubes: Pick your reversal mode

(2009) Julien Bachmann et al.   JOURNAL OF APPLIED PHYSICS

Annealing behavior of atomic layer deposited HfO2 films studied by synchrotron x-ray reflectivity and grazing incidence small angle scattering

(2009) M. L. Green et al.   JOURNAL OF APPLIED PHYSICS

Structural analysis, elemental profiling, and electrical characterization of HfO2 thin films deposited on In0.53Ga0.47As surfaces by atomic layer deposition

(2009) R. D. Long et al.   JOURNAL OF APPLIED PHYSICS

ZnO grown by atomic layer deposition: A material for transparent electronics and organic heterojunctions

(2009) E. Guziewicz et al.   JOURNAL OF APPLIED PHYSICS

Structural phase transformation of Y2O3 doped HfO2 films grown on Si using atomic layer deposition

(2009) Prodyut Majumder et al.   JOURNAL OF APPLIED PHYSICS

Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition

(2009) P. F. Carcia et al.   JOURNAL OF APPLIED PHYSICS

MOCVD growth of GaN on Si(111) substrates using an ALD-grown Al2O3 interlayer

(2009) William E. Fenwick et al.   JOURNAL OF CRYSTAL GROWTH

Epitaxial NiO (100) and NiO (111) films grown by atomic layer deposition

(2009) E. Lindahl et al.   JOURNAL OF CRYSTAL GROWTH

Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

(2009) Jaakko Niinistö et al.   JOURNAL OF CRYSTAL GROWTH

Oxide Electronics by Spatial Atomic Layer Deposition

(2009) David H. Levy et al.   Journal of Display Technology

Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

(2009) Andrew Brzezinski et al.   JOURNAL OF MATERIALS CHEMISTRY

Highly entangled hollow TiO2 nanoribbons templating diphenylalanine assembly

(2009) Tae Hee Han et al.   JOURNAL OF MATERIALS CHEMISTRY

A novel approach for fabrication of bismuth-silicon dioxide core-shell structures by atomic layer deposition

(2009) Jongmin Lee et al.   JOURNAL OF MATERIALS CHEMISTRY

Atomic layer deposition of hafnium silicate film for high mobility pentacene thin film transistor applications

(2009) Seunghyup Lee et al.   JOURNAL OF MATERIALS CHEMISTRY

Synthesis and applications of nanocrystalline nitride materials

(2009) Baishakhi Mazumder et al.   JOURNAL OF MATERIALS CHEMISTRY

Enhanced performance of dye-sensitized solar cells by an Al2O3 charge-recombination barrier formed by low-temperature atomic layer deposition

(2009) Ching Lin et al.   JOURNAL OF MATERIALS CHEMISTRY

Atomic layer deposition of lithium containing thin films

(2009) Matti Putkonen et al.   JOURNAL OF MATERIALS CHEMISTRY

Growth and characterization of ZnO films on (11-20) sapphire substrates by atomic layer deposition using DEZn and N2O

(2009) Kuo-Yi Yen et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Modification of nanoporous supported lyotropic liquid crystal polymer membranes by atomic layer deposition

(2009) Xinhua Liang et al.   JOURNAL OF MEMBRANE SCIENCE

Coating of Nanoporous Membranes: Atomic Layer Deposition versus Sputtering

(2009) K. Grigoras et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis

(2009) Mikko Heikkilä et al.   JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY

Thermal Chemistry of Tetrakis(ethylmethylamido)titanium on Si(100) Surfaces†

(2009) Byung-Chang Kan et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†

(2009) R. A. Wind et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Nanoencapsulation and Stabilization of Single-Molecule/Particle Electronic Nanoassemblies Using Low-Temperature Atomic Layer Deposition

(2009) Jeong-Seok Na et al.   Journal of Physical Chemistry C

In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide

(2009) Jinhee Kwon et al.   Journal of Physical Chemistry C

Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

(2009) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Titania Nanofilm with Electrical Switching Effects upon Hydrogen/Air Exposure at Room Temperature

(2009) Manippady K. Kumar et al.   Journal of Physical Chemistry C

Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4

(2009) Nicholas G. Kubala et al.   Journal of Physical Chemistry C

Growth of Noble Metal Ru Thin Films by Liquid Injection Atomic Layer Deposition

(2009) Seong Keun Kim et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone

(2009) Martin Rose et al.   Journal of Physical Chemistry C

Surface Acidity and Properties of TiO2/SiO2 Catalysts Prepared by Atomic Layer Deposition: UV−visible Diffuse Reflectance, DRIFTS, and Visible Raman Spectroscopy Studies

(2009) Junling Lu et al.   Journal of Physical Chemistry C

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Surface Passivation of Nanoporous TiO2 via Atomic Layer Deposition of ZrO2 for Solid-State Dye-Sensitized Solar Cell Applications

(2009) Tina C. Li et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Suppression of Forward Electron Injection from Ru(dcbpy)2(NCS)2 to Nanocrystalline TiO2 Film As a Result of an Interfacial Al2O3 Barrier Layer Prepared with Atomic Layer Deposition

(2009) Liisa J. Antila et al.   Journal of Physical Chemistry Letters

Investigation of the effects of interface carrier concentration on ZnO thin film transistors fabricated by atomic layer deposition

(2009) Seokhwan Bang et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Use of atomic layer deposition to improve the stability of silver substrates forin situ, high-temperature SERS measurements

(2009) Joshy F. John et al.   JOURNAL OF RAMAN SPECTROSCOPY

Low-Temperature Atomic Layer-Deposited TiO2Films with Low Photoactivity

(2009) Xinhua Liang et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Synthesis and Gas Sensing Properties of TiO2-ZnO Core-Shell Nanofibers

(2009) Jae Young Park et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Direct Atomic-Scale Observation of Redox-Induced Cation Dynamics in an Oxide-Supported Monolayer Catalyst: WOx/α-Fe2O3(0001)

(2009) Zhenxing Feng et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Copper−Metal Deposition on Self Assembled Monolayer for Making Top Contacts in Molecular Electronic Devices

(2009) Oliver Seitz et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

TiO2/TiSi2Heterostructures for High-Efficiency Photoelectrochemical H2O Splitting

(2009) Yongjing Lin et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium

(2009) Viljami Pore et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Growth of Crystalline Gd2O3Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition

(2009) Andrian P. Milanov et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films

(2009) C. Hossbach et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Selective Wet-Chemical Etching of the Barrier Layer during Formation of Porous Anodic Aluminum Oxide Template

(2009) Sang-Hyun Park et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Two-Step Atomic Layer Deposition of Tantalum Nitride for Cu Diffusion Barrier

(2009) Jung-Dae Kwon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Substrate Materials and Deposition Temperature Dependent Growth Characteristics and Photocatalytic Properties of ALD TiO[sub 2] Films

(2009) Hsyi-En Cheng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Enhanced ALD of TiO[sub 2] Thin Films on SUS 304 Stainless Steel for Photocatalytic Application

(2009) Chang-Soo Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]

(2009) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

ESD and ALD Depositions of Ta[sub 2]O[sub 5] Thin Films Investigated as Barriers to Copper Diffusion for Advanced Metallization

(2009) A. Lintanf Salaün et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications

(2009) L. Wu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol

(2009) Jian Liu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Hafnium Dioxide on TiN and Self-Assembled Monolayer Molecular Film

(2009) Zhong Chen et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

(2009) Gyu-Jin Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

The Importance of Moisture Control for EOT Scaling of Hf-Based Dielectrics

(2009) Lars-Åke Ragnarsson et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Impact of Germanium Surface Conditioning and ALD-growth Temperature on Al[sub 2]O[sub 3]/ZrO[sub 2] High-k Dielectric Stacks

(2009) Ole Bethge et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Study on Atomic Layer Deposition of Amorphous Rhodium Oxide Thin Films

(2009) Jani Hämäläinen et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of TiO[sub 2] Films on Ru Buffered TiN Electrode for Capacitor Applications

(2009) Gyu-Jin Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2]

(2009) Thomas Waechtler et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Microencapsulation of Moisture-Sensitive CaS:Eu[sup 2+] Particles with Aluminum Oxide

(2009) N. Avci et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Thermal and Plasma Enhanced Atomic Layer Deposition of Al[sub 2]O[sub 3] on GaAs Substrates

(2009) Sonja Sioncke et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Liquid Injection Atomic Layer Deposition of Crystalline TiO[sub 2] Thin Films with a Smooth Morphology from Ti(O-i-Pr)[sub 2](DPM)[sub 2]

(2009) Seong Keun Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

H[sub 2]O- and O[sub 3]-Based Atomic Layer Deposition of High-κ Dielectric Films on GeO[sub 2] Passivation Layers

(2009) A. Delabie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

HfO[sub 2]/HfO[sub x]N[sub y]/HfO[sub 2] Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer

(2009) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Area-Selective Atomic Layer Deposition Using Self-Assembled Monolayer and Scanning Probe Lithography

(2009) Wonyoung Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

(2009) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

(2009) J. Musschoot et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Enhanced Stability of LiCoO[sub 2] Cathodes in Lithium-Ion Batteries Using Surface Modification by Atomic Layer Deposition

(2009) Yoon Seok Jung et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

High Temperature Atomic Layer Deposition of Ruthenium from N,N-Dimethyl-1-ruthenocenylethylamine

(2009) Kaupo Kukli et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Impact of Precursor Chemistry and Process Conditions on the Scalability of ALD HfO[sub 2] Gate Dielectrics

(2009) Johan Swerts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Strontium Titanate Films Using Sr([sup t]Bu[sub 3]Cp)[sub 2] and Ti(OMe)[sub 4]

(2009) M. Popovici et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer

(2009) Elina Färm et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant

(2009) Han-Bo-Ram Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation

(2009) Seokhoon Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer

(2009) Hyungseok Hong et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Extra-Low Temperature Growth of ZnO Thin Films by Atomic Layer Deposition

(2009) E. Guziewicz et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Microstructure of Intrinsic ZnO Thin Film Grown by Using Atomic Layer Deposition

(2009) Jae-Sung Hur et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Effects of Confinement on the Valley Splitting of Si Quantum Structures

(2009) S. N. Ko et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films

(2009) Woong-Sun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Influence of a ZnO Coating on the Photoluminescence Properties of SnO2 Nanobelts

(2009) Sunghoon Park et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Characteristics of Zinc-Oxide-Sulfide-Mixed Films Deposited by Using Atomic Layer Deposition

(2009) Sunyeol Jeon et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Effect of Process Parameters on Remote PEALD for HighlyTransparent ZnO Film Growth

(2009) Sung-Ku Kwon et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

ALD-Grown ZnO Thin-Film Transistor with a Polymeric Dielectric

(2009) Woon-Seop Choi   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric

(2009) Hyeong-Seon Yun et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Characteristics of La$_2$O$_3$ Thin Films Deposited Using the ECR Atomic Layer Deposition Method

(2009) Woong-Sun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor

(2009) Dae-Yong Moon et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas

(2009) Woo-Hee Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Deposition of Al$_{2}$O$_{3}$ by Using ECR-ALD for OrganicSubstrate Devices

(2009) Woong-Sun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2

(2009) Junghoon Joo et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

High-temperature metal coating for modification of photonic band edge position

(2009) Timothy A. Walsh et al.   JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS

Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications

(2009) Sumit Kumar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition

(2009) Pieter C. Rowlette et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers

(2009) K. Nevalainen et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Investigation of interfacial layer development between thin Al2O3 films grown using atomic layer deposition and Si(100), Ge(100), or GaAs(100)

(2009) L. Lamagna et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals

(2009) G. B. Rayner et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Chemical and structural properties of atomic layer deposited La2O3 films capped with a thin Al2O3 layer

(2009) X. L. Li et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition of GaN using GaCl3 and NH3

(2009) Oh Hyun Kim et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Characterization of ALD copper thin films on palladium seed layers

(2009) Irene J. Hsu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

(2009) A. J. M. Mackus et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Physicochemical and electrical characterizations of atomic layer deposition grown HfO[sub 2] on TiN and Pt for metal-insulator-metal application

(2009) C. Jorel et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursors

(2009) S. Dueñas et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics

(2009) H. García et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

HfO[sub 2]∕Si interface formation in atomic layer deposition films: An in situ investigation

(2009) Massimo Tallarida et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films

(2009) C. X. Shan et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition

(2009) Kaupo Kukli et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Epitaxial growth of high-κ TiO[sub 2] rutile films on RuO[sub 2] electrodes

(2009) K. Fröhlich et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Effect of annealing and electrical properties of high-κ thin films grown by atomic layer deposition using carboxylic acids as oxygen source

(2009) E. Rauwel et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching

(2009) Junbo Feng et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Titania Nanostructures Fabricated by Atomic Layer Deposition Using Spherical Protein Cages

(2009) Hyunbin Kim et al.   LANGMUIR

Identification and Passivation of Defects in Self-Assembled Monolayers

(2009) Michael J. Preiner et al.   LANGMUIR

Atomic Layer Deposition of Aluminum Oxide on Carboxylic Acid-Terminated Self-Assembled Monolayers

(2009) Meng Li et al.   LANGMUIR

Toward Plasmonic Solar Cells: Protection of Silver Nanoparticles via Atomic Layer Deposition of TiO2

(2009) Stacey D. Standridge et al.   LANGMUIR

Reaction Mechanism Studies on Atomic Layer Deposition of Nb2O5from Nb(OEt)5and Water

(2009) Kjell Knapas et al.   LANGMUIR

Atomic Layer Deposition and Abrupt Wetting Transitions on Nonwoven Polypropylene and Woven Cotton Fabrics

(2009) G. Kevin Hyde et al.   LANGMUIR

Pore sealing of mesoporous silica low-k dielectrics by oxygen and argon plasma treatments

(2009) Chih-Chieh Chang et al.   MICROELECTRONIC ENGINEERING

Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning (Invited Paper)

(2009) Matty Caymax et al.   MICROELECTRONIC ENGINEERING

Deposition of HfO2 on InAs by atomic-layer deposition

(2009) D. Wheeler et al.   MICROELECTRONIC ENGINEERING

Electrical properties of atomic-layer-deposited La2O3 films using a novel La formamidinate precursor and ozone

(2009) B. Lee et al.   MICROELECTRONIC ENGINEERING

Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices

(2009) A. Lintanf-Salaün et al.   MICROELECTRONIC ENGINEERING

Texture of atomic layer deposited ruthenium

(2009) J. Musschoot et al.   MICROELECTRONIC ENGINEERING

Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition

(2009) Bum Ho Choi et al.   MICROELECTRONIC ENGINEERING

Atomic layer deposition of high capacitance density Ta2O5–ZrO2 based dielectrics for metal–insulator–metal structures

(2009) Indrek Jõgi et al.   MICROELECTRONIC ENGINEERING

Driving characteristics of the electrowetting-on-dielectric device using atomic-layer-deposited aluminum oxide as the dielectric

(2009) Jong-hyeon Chang et al.   Microfluidics and Nanofluidics

Structural and chemical modification of porous alumina membranes

(2009) Leonora Velleman et al.   MICROPOROUS AND MESOPOROUS MATERIALS

Ionic Field Effect Transistors with Sub-10 nm Multiple Nanopores

(2009) Sung-Wook Nam et al.   NANO LETTERS

Surface Modification of Yttria-Stabilized Zirconia Electrolyte by Atomic Layer Deposition

(2009) Cheng-Chieh Chao et al.   NANO LETTERS

Amplified spontaneous emission from ZnO in n-ZnO/ZnO nanodots–SiO2composite/p-AlGaN heterojunction light-emitting diodes

(2009) Ying Tsang Shih et al.   NANOTECHNOLOGY

Atomic layer deposition of quantum-confined ZnO nanostructures

(2009) David M King et al.   NANOTECHNOLOGY

ZnTe–ZnO core–shell radial heterostructures grown by the combination of molecular beam epitaxy and atomic layer deposition

(2009) E Janik et al.   NANOTECHNOLOGY

Ta2O5- and TiO2-based nanostructures made by atomic layer deposition

(2009) Marianna Kemell et al.   NANOTECHNOLOGY

Atomic layer deposition of ZnS nanotubes

(2009) Sh Farhangfar et al.   NANOTECHNOLOGY

An efficient Si light-emitting diode based on an n- ZnO/SiO2–Si nanocrystals-SiO2/p-Si heterostructure

(2009) Edward Sun et al.   NANOTECHNOLOGY

Synthesis of SnO2–ZnO core–shell nanofibers via a novel two-step process and their gas sensing properties

(2009) Sun-Woo Choi et al.   NANOTECHNOLOGY

Atomic layer deposition on gram quantities of multi-walled carbon nanotubes

(2009) Andrew S Cavanagh et al.   NANOTECHNOLOGY

Nanotubular metal–insulator–metal capacitor arrays for energy storage

(2009) Parag Banerjee et al.   Nature Nanotechnology

Elastic behaviour of titanium dioxide films on polyimide substrates studied by in situ tensile testing in a X-ray diffractometer

(2009) Elza Bontempi et al.   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition

(2009) Nicholas T. Gabriel et al.   OPTICS LETTERS

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

The controlled deposition of metal oxides onto carbon nanotubes by atomic layer deposition: examples and a case study on the application of V2O4 coated nanotubes in gas sensing

(2009) Marc-Georg Willinger et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Low-temperature ZnO atomic layer deposition on biotemplates: flexible photocatalytic ZnO structures from eggshell membranes

(2009) Seung-Mo Lee et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Phase transformations in titanium dioxide thin films during chemical synthesis under strongly nonequilibrium conditions

(2009) A. P. Belyaev et al.   PHYSICS OF THE SOLID STATE

Plasma-Assisted Atomic Layer Deposition of Al2O3at Room Temperature

(2009) Tommi O. Kääriäinen et al.   Plasma Processes and Polymers

Adhesion of Ti and TiC Coatings on PMMA Subject to Plasma Treatment: Effect of Intermediate Layers of Al2O3and TiO2Deposited by Atomic Layer Deposition

(2009) Tommi O. Kääriäinen et al.   Plasma Processes and Polymers

Effect of the substrate nature on the formation of thin titanium dioxide films by molecular layering

(2009) V. V. Antipov et al.   RUSSIAN JOURNAL OF APPLIED CHEMISTRY

Greatly Increased Toughness of Infiltrated Spider Silk

(2009) S.-M. Lee et al.   SCIENCE

Atomic layer-deposited platinum in high-k/metal gate stacks

(2009) Christoph Henkel et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Photoluminescence, electrical and structural properties of ZnO films, grown by ALD at low temperature

(2009) E Przeździecka et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Controlled Growth of Platinum Nanoparticles on Strontium Titanate Nanocubes by Atomic Layer Deposition

(2009) Steven T. Christensen et al.   Small

Tailoring the Pore Size and Architecture of CeO2/TiO2Core/Shell Inverse Opals by Atomic Layer Deposition

(2009) Ivano Alessandri et al.   Small

Atomic Layer Deposition of Platinum Nanoparticles on Carbon Nanotubes for Application in Proton-Exchange Membrane Fuel Cells

(2009) Chueh Liu et al.   Small

Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment

(2009) Dong Jin Park et al.   SOLID-STATE ELECTRONICS

Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition

(2009) V. Sammelselg et al.   SURFACE & COATINGS TECHNOLOGY

Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta

(2009) Kelly M. Thom et al.   SURFACE SCIENCE

Low temperature atomic layer deposition of high-k dielectric stacks for scaled metal-oxide-semiconductor devices

(2009) Ole Bethge et al.   THIN SOLID FILMS

Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3

(2009) Kwangchol Park et al.   THIN SOLID FILMS

Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films

(2009) Woong-Sun Kim et al.   THIN SOLID FILMS

Molecular layer deposition of ZrO2-based organic–inorganic nanohybrid thin films for organic thin film transistors

(2009) Byoung H. Lee et al.   THIN SOLID FILMS

Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates

(2009) Tsung-Liang Chen et al.   THIN SOLID FILMS

Thin films of In2O3 by atomic layer deposition using In(acac)3

(2009) O. Nilsen et al.   THIN SOLID FILMS

Atomic layer deposition of an HfO2 thin film using Hf(O-iPr)4

(2009) Jeong Chan Kim et al.   THIN SOLID FILMS

Ultrathin tunnel insulator films on silicon for electrochemiluminescence studies

(2009) A.J. Niskanen et al.   THIN SOLID FILMS

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

(2009) Qi Xie et al.   THIN SOLID FILMS

Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films

(2009) Matti Putkonen et al.   THIN SOLID FILMS

Interface roughness effect between gate oxide and metal gate on dielectric property

(2009) J.Y. Son et al.   THIN SOLID FILMS

Fabrication of epitaxial ZnO films by atomic-layer deposition with interrupted flow

(2009) Ching-Shun Ku et al.   THIN SOLID FILMS

Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O

(2009) B.B. Burton et al.   THIN SOLID FILMS

ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxide

(2009) M. Godlewski et al.   THIN SOLID FILMS

Properties of atomic layer deposited HfO2 thin films

(2009) Justin C. Hackley et al.   THIN SOLID FILMS

Titanium dioxide thin films, their structure and its effect on their photoactivity and photocatalytic properties

(2009) M.-L. Kääriäinen et al.   THIN SOLID FILMS

Atomic layer deposition of HfO2 on self-assembled monolayer-passivated Ge surfaces

(2009) Kibyung Park et al.   THIN SOLID FILMS

Monocrystalline zinc oxide films grown by atomic layer deposition

(2009) Ł. Wachnicki et al.   THIN SOLID FILMS

Growth of RuO2 thin films by liquid injection atomic layer deposition

(2009) K. Hušeková et al.   THIN SOLID FILMS

In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

(2009) Krzysztof Kolanek et al.   THIN SOLID FILMS

Native oxide consumption during the atomic layer deposition of TiO2 films on GaAs (100) surfaces

(2009) Theodosia Gougousi et al.   THIN SOLID FILMS

Low temperature atomic layer deposition of titania thin films

(2009) G. Triani et al.   THIN SOLID FILMS

Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers

(2009) Christopher L. Platt et al.   THIN SOLID FILMS

Electrical characterisation of HfYO MIM-structures deposited by ALD

(2009) T. Roessler et al.   THIN SOLID FILMS

Atomic layer deposited (ALD) TiO2 and TiO2−x-Nx thin film photocatalysts in salicylic acid decomposition

(2009) S. H. Vilhunen et al.   WATER SCIENCE AND TECHNOLOGY

Atomic Layer Deposition of UV-Absorbing ZnO Films on SiO2 and TiO2 Nanoparticles Using a Fluidized Bed Reactor

(2008) David M. King et al.   ADVANCED FUNCTIONAL MATERIALS

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

(2008) Seong Keun Kim et al.   ADVANCED MATERIALS

Aerogel Templated ZnO Dye-Sensitized Solar Cells

(2008) Thomas W. Hamann et al.   ADVANCED MATERIALS

Transparent and Photo-stable ZnO Thin-film Transistors to Drive an Active Matrix Organic-Light- Emitting-Diode Display Panel

(2008) Sang-Hee K. Park et al.   ADVANCED MATERIALS

Atomic Layer Deposition of ZnO in Quantum Dot Thin Films

(2008) Alexandre Pourret et al.   ADVANCED MATERIALS

Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition

(2008) Erwan Rauwel et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

(2008) Julien Bachmann et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

TiO2 microstructures by inversion of macroporous silicon using atomic layer deposition

(2008) A. Langner et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Impact of Surface Hydrophilicization prior to Atomic Layer Deposition for HfO2/Si Direct-Contact Gate Stacks

(2008) Yukinori Morita et al.   Applied Physics Express

S passivation of GaAs and band bending reduction upon atomic layer deposition of HfO2/Al2O3 nanolaminates

(2008) F. S. Aguirre-Tostado et al.   APPLIED PHYSICS LETTERS

Spontaneous nanoclustering of ZrO2 in atomic layer deposited LayZr1−yOx thin films

(2008) K. B. Jinesh et al.   APPLIED PHYSICS LETTERS

Pre-atomic layer deposition surface cleaning and chemical passivation of (100) In0.2Ga0.8As and deposition of ultrathin Al2O3 gate insulators

(2008) Byungha Shin et al.   APPLIED PHYSICS LETTERS

Effect of rapid thermal annealing on optical and interfacial properties of atomic-layer-deposited Lu2O3 films on Si (100)

(2008) H. L. Lu et al.   APPLIED PHYSICS LETTERS

Atomic-layer-deposited nanostructures for graphene-based nanoelectronics

(2008) Y. Xuan et al.   APPLIED PHYSICS LETTERS

In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors

(2008) Cheng-Wei Cheng et al.   APPLIED PHYSICS LETTERS

Synthesis and optical properties of ZnO and carbon nanotube based coaxial heterostructures

(2008) D. S. Kim et al.   APPLIED PHYSICS LETTERS

Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate

(2008) C. Y. Kim et al.   APPLIED PHYSICS LETTERS

Electrical characteristics of metal-oxide-semiconductor capacitors on p-GaAs using atomic layer deposition of ultrathin HfAlO gate dielectric

(2008) Rahul Suri et al.   APPLIED PHYSICS LETTERS

The effect of aluminum oxide incorporation on the material and electrical properties of hafnium oxide on Ge

(2008) Monica Sawkar-Mathur et al.   APPLIED PHYSICS LETTERS

Energy barriers at interfaces of (100)GaAs with atomic layer deposited Al2O3 and HfO2

(2008) V. V. Afanas’ev et al.   APPLIED PHYSICS LETTERS

In situ H2S passivation of In0.53Ga0.47As∕InP metal-oxide-semiconductor capacitors with atomic-layer deposited HfO2 gate dielectric

(2008) E. O’Connor et al.   APPLIED PHYSICS LETTERS

Effects of postnitridation annealing on band gap and band offsets of nitrided Hf-silicate films

(2008) K. B. Chung et al.   APPLIED PHYSICS LETTERS

Measuring the microwave frequency relative permittivity of polyetherimide/BaTi4O9 composites by using a rectangular cavity resonator

(2008) Cheng-Fu Yang et al.   APPLIED PHYSICS LETTERS

An evaluation of thermal stability of TiB2 metal gate on Hf silicate for p-channel metal oxide semiconductor application

(2008) S. Y. Son et al.   APPLIED PHYSICS LETTERS

Formation of an oxide-free Ge∕TiO2 interface by atomic layer deposition on brominated Ge

(2008) Pendar Ardalan et al.   APPLIED PHYSICS LETTERS

Reduction in threading dislocation densities in AlN epilayer by introducing a pulsed atomic-layer epitaxial buffer layer

(2008) L. W. Sang et al.   APPLIED PHYSICS LETTERS

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

Creating large area molecular electronic junctions using atomic layer deposition

(2008) Michael J. Preiner et al.   APPLIED PHYSICS LETTERS

Permittivity enhancement of hafnium dioxide high-κ films by cerium doping

(2008) P. R. Chalker et al.   APPLIED PHYSICS LETTERS

Interface of atomic layer deposited HfO2 films on GaAs (100) surfaces

(2008) Justin C. Hackley et al.   APPLIED PHYSICS LETTERS

Reproducible growth of p-type ZnO:N using a modified atomic layer deposition process combined with dark annealing

(2008) L. Dunlop et al.   APPLIED PHYSICS LETTERS

Half-cycle atomic layer deposition reaction studies of Al2O3 on (NH4)2S passivated GaAs(100) surfaces

(2008) M. Milojevic et al.   APPLIED PHYSICS LETTERS

Stable ZnO thin film transistors by fast open air atomic layer deposition

(2008) David H. Levy et al.   APPLIED PHYSICS LETTERS

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

(2008) Bongki Lee et al.   APPLIED PHYSICS LETTERS

GaAs interfacial self-cleaning by atomic layer deposition

(2008) C. L. Hinkle et al.   APPLIED PHYSICS LETTERS

Indium-free transparent organic light emitting diodes with Al doped ZnO electrodes grown by atomic layer and pulsed laser deposition

(2008) J. Meyer et al.   APPLIED PHYSICS LETTERS

Fabrication of ZnO/Al2O3 core–shell nanostructures and crystalline Al2O3 nanotube

(2008) Jingyun Huang et al.   APPLIED SURFACE SCIENCE

Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties

(2008) Aivar Tarre et al.   APPLIED SURFACE SCIENCE

Passivation of GaAs surface by atomic-layer-deposited titanium nitride

(2008) M. Bosund et al.   APPLIED SURFACE SCIENCE

Structural properties of Al2O3 dielectrics grown on TiN metal substrates by atomic layer deposition

(2008) Chun-I. Hsieh et al.   APPLIED SURFACE SCIENCE

Capture and alignment of phi29 viral particles in sub-40 nanometer porous alumina membranes

(2008) Jeong-Mi Moon et al.   BIOMEDICAL MICRODEVICES

Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties

(2008) Moon-Kyun Song et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors

(2008) Ma˚rten Rooth et al.   CHEMICAL VAPOR DEPOSITION

The Atomic Layer Deposition of HfO2and ZrO2using Advanced Metallocene Precursors and H2O as the Oxygen Source

(2008) Charles L. Dezelah et al.   CHEMICAL VAPOR DEPOSITION

Bis(tert-butylimido)-bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group

(2008) Ville Miikkulainen et al.   CHEMICAL VAPOR DEPOSITION

An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD

(2008) Michael T. Seman et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

(2008) Tero Pilvi et al.   CHEMICAL VAPOR DEPOSITION

Coating of Highly Porous Fiber Matrices by Atomic Layer Deposition

(2008) Marianna Kemell et al.   CHEMICAL VAPOR DEPOSITION

Two-Stage Atomic Layer Deposition of Aluminum Oxide on Alkanethiolate Self-Assembled Monolayers Usingn-Propanol and Water as Oxygen Sources

(2008) Nobuhiko P. Kobayashi et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Aluminum Oxide Thin Films from a Heteroleptic, Amidinate-Containing Precursor

(2008) Allison L. Brazeau et al.   CHEMISTRY OF MATERIALS

Nanostructured Pure Anatase Titania Tubes Replicated from Electrospun Polymer Fiber Templates by Atomic Layer Deposition

(2008) G.-M. Kim et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)3and Ozone

(2008) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Growth Behavior of Al-Doped TiO2Thin Films by Atomic Layer Deposition

(2008) Seong Keun Kim et al.   CHEMISTRY OF MATERIALS

Rapid SiO2Atomic Layer Deposition Using Tris(tert-pentoxy)silanol

(2008) B. B. Burton et al.   CHEMISTRY OF MATERIALS

Hierarchical Three-Dimensional ZnO and Their Shape-Preserving Transformation into Hollow ZnAl2O4Nanostructures

(2008) Yang Yang et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2and Ozone

(2008) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Application of Atomic Layer Deposition of Platinum to Solid Oxide Fuel Cells

(2008) Xirong Jiang et al.   CHEMISTRY OF MATERIALS

Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High-κ Dielectrics Using Ozone

(2008) Jinhee Kwon et al.   CHEMISTRY OF MATERIALS

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of ZrO2from (CpMe)2Zr(OMe)Me and Water or Ozone

(2008) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of MgF2Thin Films Using TaF5as a Novel Fluorine Source

(2008) Tero Pilvi et al.   CHEMISTRY OF MATERIALS

The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD

(2008) Jaeyeong Heo et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Visible Light Activity of Nitrogen-Doped TiO[sub 2] Thin Films Grown by Atomic Layer Deposition

(2008) Hsyi-En Cheng et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Memory Characteristics of Atomic-Layer-Deposited High-κ HfAlO Nanocrystal Capacitors

(2008) S. Maikap et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic Layer Deposition of Silicon Oxide Thin Films by Alternating Exposures to Si[sub 2]Cl[sub 6] and O[sub 3]

(2008) Seung-Won Lee et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates

(2008) Seong Keun Kim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Controlling the Composition of Doped Materials by ALD: A Case Study for Al-Doped TiO[sub 2] Films

(2008) Seong Keun Kim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application

(2008) Sung-Soo Yim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Formation of Ru Nanotubes by Atomic Layer Deposition onto an Anodized Aluminum Oxide Template

(2008) Do-Joong Lee et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper

(2008) L. Wu et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process

(2008) Sung-Wook Kim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Growth of High-Dielectric-Constant TiO[sub 2] Films in Capacitors with RuO[sub 2] Electrodes

(2008) K. Fröhlich et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films

(2008) Jaakko Niinistö et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Surface modification of thermoplastics by atomic layer deposition of Al2O3 and TiO2 thin films

(2008) Marianna Kemell et al.   EUROPEAN POLYMER JOURNAL

Preparation of tin oxide nanocoatings on borosilicate glass by the molecular layering method

(2008) V. V. Antipov et al.   GLASS PHYSICS AND CHEMISTRY

ZnO Thin-Film Transistor Ring Oscillators with 31-ns Propagation Delay

(2008) Jie Sun et al.   IEEE ELECTRON DEVICE LETTERS

Low-Threshold Stimulated Emission in ZnO Thin Films Grown by Atomic Layer Deposition

(2008) Hsing-Chao Chen et al.   IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS

Ultraviolet Electroluminescence From n-ZnO–SiO$_{2}$–ZnO Nanocomposite/p-GaN Heterojunction Light-Emitting Diodes at Forward and Reverse Bias

(2008) M.K. Wu et al.   IEEE PHOTONICS TECHNOLOGY LETTERS

Atomic-Layer-Deposited Alumina $(\hbox{Al}_{2}\hbox{O}_{3})$ Coating on Thin-Film Cryoresistors

(2008) O.M. Hahtela et al.   IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT

Atomic Layer Deposition Al$_{2}$O$_{3}$ Films for Permanent Magnet Isolation in TMR Read Heads

(2008) M.C. Kautzky et al.   IEEE TRANSACTIONS ON MAGNETICS

In situsynthesis of TiO2-functionalized metal nanoparticles

(2008) David M. King et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Synthesis, Characterization, and Thermal Properties of Homoleptic Rare-Earth Guanidinates: Promising Precursors for MOCVD and ALD of Rare-Earth Oxide Thin Films

(2008) Andrian P. Milanov et al.   INORGANIC CHEMISTRY

Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique

(2008) Sanghyun Woo et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Growth of Dielectric Al2O3Films by Atomic Layer Deposition

(2008) Elisa Ghiraldelli et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Novel Contact-Plug Process with Low-Resistance Nucleation Layer Using Diborane-Reduction Tungsten Atomic-Layer-Deposition Method for 32 nm Complementary Metal–Oxide–Semiconductor Devices and Beyond

(2008) Akie Yutani et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Optical AlxTi1-xOyFilms Grown by Plasma Enhanced Atomic Layer Deposition

(2008) Jung Wook Lim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Effect of chlorine residue on electrical performance of atomic layer deposited hafnium silicate

(2008) Qing-Qing Sun et al.   JOURNAL OF APPLIED PHYSICS

Effects of surface treatments using O3 and NH3 on electrical properties and chemical structures of high-k HfO2 dielectric films on strained Si1−xGex∕Si substrates

(2008) Tae Joo Park et al.   JOURNAL OF APPLIED PHYSICS

The initial atomic layer deposition of HfO2∕Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy

(2008) Massimo Tallarida et al.   JOURNAL OF APPLIED PHYSICS

Berreman effect in infrared absorption spectroscopy of ionic oxide coatings formed by atomic layer deposition on three-dimensional structures

(2008) Giovanna Scarel et al.   JOURNAL OF APPLIED PHYSICS

Electronic structure of the interface of aluminum nitride with Si(100)

(2008) M. Badylevich et al.   JOURNAL OF APPLIED PHYSICS

HfO2 gate dielectric on (NH4)2S passivated (100) GaAs grown by atomic layer deposition

(2008) P. T. Chen et al.   JOURNAL OF APPLIED PHYSICS

Silicon surface passivation by atomic layer deposited Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

(2008) Sung-Soo Yim et al.   JOURNAL OF APPLIED PHYSICS

Cubic phase stabilization in nanoparticles of hafnia-zirconia oxides: Particle-size and annealing environment effects

(2008) Chih-Hsin Lu et al.   JOURNAL OF APPLIED PHYSICS

Extremely low temperature growth of ZnO by atomic layer deposition

(2008) E. Guziewicz et al.   JOURNAL OF APPLIED PHYSICS

The relationship between local order, long range order, and sub-band-gap defects in hafnium oxide and hafnium silicate films

(2008) D. H. Hill et al.   JOURNAL OF APPLIED PHYSICS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

Phase control of iridium and iridium oxide thin films in atomic layer deposition

(2008) Sung-Wook Kim et al.   JOURNAL OF APPLIED PHYSICS

Optical and structural characteristics of ZnO films grown on (0001) sapphire substrates by ALD using DEZn and N2O

(2008) Ping-Yuan Lin et al.   JOURNAL OF CRYSTAL GROWTH

Atomic layer deposition of titanium dioxide nanostructures using carbon nanosheets as a template

(2008) Mårten Rooth et al.   JOURNAL OF CRYSTAL GROWTH

Structural and optical properties of low-temperature ZnO films grown by atomic layer deposition with diethylzinc and water precursors

(2008) I.A. Kowalik et al.   JOURNAL OF CRYSTAL GROWTH

Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors

(2008) Kate Black et al.   JOURNAL OF MATERIALS CHEMISTRY

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

(2008) Francisco Zaera   JOURNAL OF MATERIALS CHEMISTRY

Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films

(2008) Jaakko Niinistö et al.   JOURNAL OF MATERIALS CHEMISTRY

Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability

(2008) Minha Seo et al.   JOURNAL OF MATERIALS CHEMISTRY

Template-directed gas-phase fabrication of oxide nanotubes

(2008) Changdeuck Bae et al.   JOURNAL OF MATERIALS CHEMISTRY

Non-aqueous sol–gel routes applied to atomic layer deposition of oxides

(2008) Guylhaine Clavel et al.   JOURNAL OF MATERIALS CHEMISTRY

Amorphous to anatase transformation in atomic layer deposited titania thin films induced by hydrothermal treatment at 120 °C

(2008) Zhaoming Zhang et al.   JOURNAL OF MATERIALS RESEARCH

Thermochemistry of nanoparticles on a substrate: Zinc oxide on amorphous silica

(2008) Tatiana Y. Shvareva et al.   JOURNAL OF MATERIALS RESEARCH

Barrier properties of polymer/alumina nanocomposite membranes fabricated by atomic layer deposition

(2008) Xinhua Liang et al.   JOURNAL OF MEMBRANE SCIENCE

Atomic Layer Deposition of Undoped and Al-Doped ZnO Thin Films Usingthe Zn Alkoxide Precursor Methylzinc Isopropoxide

(2008) Ki-Seok An et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Growth and Characterization of Titanium Silicate Nanofilms for Gate Oxide Applications

(2008) Seungjae Lee et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

CO Gas Sensing by Ultrathin Tin Oxide Films Grown by Atomic Layer Deposition Using Transmission FTIR Spectroscopy†

(2008) X. Du et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Carboxylic Acids as Oxygen Sources for the Atomic Layer Deposition of High-κ Metal Oxides

(2008) Erwan Rauwel et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of TiO2 to Bond Free-Standing Nanoporous Alumina Templates to Gold-Coated Substrates as Planar Optical Waveguide Sensors

(2008) Lee Kheng Tan et al.   Journal of Physical Chemistry C

Chemisorption of Tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C−H and C−N Bond Reactivity Leading to Low-Temperature Decomposition Pathways

(2008) Juan Carlos F. Rodríguez-Reyes et al.   Journal of Physical Chemistry C

Influence of Temperature on Evolution of Coaxial ZnO/Al2O3 One-Dimensional Heterostructures:  From Core−Shell Nanowires to Spinel Nanotubes and Porous Nanowires

(2008) Yang et al.   Journal of Physical Chemistry C

Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide

(2008) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

(2008) Elina Färm et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Indium Tin Oxide Thin Films Using Nonhalogenated Precursors

(2008) Jeffrey W. Elam et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of TiO2 on Aerogel Templates: New Photoanodes for Dye-Sensitized Solar Cells

(2008) Thomas W. Hamann et al.   Journal of Physical Chemistry C

Surface Modification of Au/TiO2 Catalysts by SiO2 via Atomic Layer Deposition

(2008) Zhen Ma et al.   Journal of Physical Chemistry C

Stability of Silver Nanoparticles Fabricated by Nanosphere Lithography and Atomic Layer Deposition to Femtosecond Laser Excitation

(2008) Jiha Sung et al.   Journal of Physical Chemistry C

Outer-Sphere Redox Couples as Shuttles in Dye-Sensitized Solar Cells. Performance Enhancement Based on Photoelectrode Modification via Atomic Layer Deposition

(2008) Thomas W. Hamann et al.   Journal of Physical Chemistry C

Physical and electrical characterization of atomic-layer-deposited Ru nanocrystals embedded into Al2O3 for memory applications

(2008) Min Zhang et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Deposition temperature effect on electrical properties and interface of high-kZrO2capacitor

(2008) Joo-Hyung Kim et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Atomic Layer Deposition on Bulk Quantities of Surfactant-Modified Single-Walled Carbon Nanotubes

(2008) Guo-Dong Zhan et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Generation of Oxide Nanopatterns by Combining Self-Assembly of S-Layer Proteins and Area-Selective Atomic Layer Deposition

(2008) Jiurong Liu et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Blocking the Lateral Film Growth at the Nanoscale in Area-Selective Atomic Layer Deposition

(2008) Robin H. A. Ras et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

(2008) Qi Xie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

(2008) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD

(2008) Sung-Wook Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle

(2008) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Properties of MIS Capacitors Using the Atomic-Layer-Deposited ZnO Semiconductor and Al[sub 2]O[sub 3] Insulator

(2008) Jaewon Song et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Comparative Study of Flatband Voltage Transients on High-k Dielectric-Based Metal–Insulator–Semiconductor Capacitors

(2008) S. Dueñas et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Improving Threshold Voltage and Device Performance of Gate-First HfSiON/Metal Gate n-MOSFETs by an ALD La[sub 2]O[sub 3] Capping Layer

(2008) Satoshi Kamiyama et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Experimental Study of ALD HfO[sub 2] Deposited on Strained Silicon-on-Insulator and Standard SOI

(2008) D. Gu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

(2008) Rajesh Katamreddy et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characteristics of Atomic-Layer-Deposited Al[sub 2]O[sub 3] High-k Dielectric Films Grown on Ge Substrates

(2008) Chao-Ching Cheng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition

(2008) Se-Hun Kwon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications

(2008) Steven Consiglio et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Morphological and Photoelectrochemical Properties of ALD TiO[sub 2] Films

(2008) Hsyi-En Cheng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effects of Surface Treatments on Interfacial Self-Cleaning in Atomic Layer Deposition of Al[sub 2]O[sub 3] on InSb

(2008) C. H. Hou et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Chemical Bonding, Interfaces, and Defects in Hafnium Oxide∕Germanium Oxynitride Gate Stacks on Ge(100)

(2008) Yasuhiro Oshima et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Hafnium Oxide on Ge and GaAs Substrates: Precursors and Surface Preparation

(2008) Annelies Delabie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Electrical Properties of Atomic Layer Deposition HfO[sub 2] and HfO[sub x]N[sub y] on Si Substrates with Various Crystal Orientations

(2008) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient

(2008) Pierre Caubet et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition

(2008) Seokhwan Bang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characteristics of Hafnium–Zirconium–Oxide Film Treated by Remote Plasma Nitridation

(2008) Seungjun Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of NiO Films on Si(100) Using Cyclopentadienyl-Type Compounds and Ozone as Precursors

(2008) H. L. Lu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Process and Material Properties of HfLaO[sub x] Prepared by Atomic Layer Deposition

(2008) Wei He et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine

(2008) B. B. Burton et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia

(2008) Moon-Kyun Song et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Nanoindentation Investigation of HfO[sub 2] and Al[sub 2]O[sub 3] Films Grown by Atomic Layer Deposition

(2008) K. Tapily et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Switching Power Reduction in Phase Change Memory Cell Using CVD Ge[sub 2]Sb[sub 2]Te[sub 5] and Ultrathin TiO[sub 2] Films

(2008) Byung Joon Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Electrochemical Properties of Pt Coatings on Ni Prepared by Atomic Layer Deposition

(2008) Robert R. Hoover et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Composition-Dependent Structural and Electrical Properties of Zr[sub x]Ti[sub y]O[sub 2] Films Grown on RuO[sub 2] Substrate by ALD

(2008) Hyuk Kwon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

(2008) Jeffrey W. Elam et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Tungsten atomic layer deposition on cobalt nanoparticles

(2008) C. A. Wilson et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

(2008) S. B. S. Heil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ferroelectric properties of Bi3.25La0.75Ti3O12 films using HfO2 as buffer layers for nonvolatile-memory field-effect transistors

(2008) Kyoung-Tae Kim et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Growth and interface of HfO2 films on H-terminated Si from a TDMAH and H2O atomic layer deposition process

(2008) Justin C. Hackley et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Field emission properties of ZnO nanorods coated with NiO film

(2008) Ji Hoon Yang et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Mechanisms of Atomic Layer Deposition on Substrates with Ultrahigh Aspect Ratios

(2008) S. O. Kucheyev et al.   LANGMUIR

Influence of passivating interlayer on Ge/HfO2 and Ge/Al2O3 interface band diagrams

(2008) V.V. Afanas’ev et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

XPS and IPE analysis of HfO2 band alignment with high-mobility semiconductors

(2008) M. Perego et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma

(2008) Qi Xie et al.   MICROELECTRONIC ENGINEERING

Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition

(2008) S. Spiga et al.   MICROELECTRONIC ENGINEERING

Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

(2008) A. Lamperti et al.   MICROELECTRONIC ENGINEERING

Advanced tungsten plug process for beyond nanometer technology

(2008) Tuung Luoh et al.   MICROELECTRONIC ENGINEERING

Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography

(2008) Yueming Hua et al.   MICROELECTRONIC ENGINEERING

Vertically stacked non-volatile memory devices – material considerations

(2008) M. Godlewski et al.   MICROELECTRONIC ENGINEERING

Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing

(2008) D. Tsoutsou et al.   MICROELECTRONIC ENGINEERING

Atomic layer deposition of titanium nitride from TDMAT precursor

(2008) J. Musschoot et al.   MICROELECTRONIC ENGINEERING

A comparison of liquid and gas phase surface preparation of III–V compound semiconductors for atomic layer deposition

(2008) F.L. Lie et al.   MICROELECTRONIC ENGINEERING

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films

(2008) B. Lee et al.   MICROELECTRONIC ENGINEERING

The influence of growth temperature and precursors’ doses on electrical parameters of ZnO thin films grown by atomic layer deposition technique

(2008) T. Krajewski et al.   MICROELECTRONICS JOURNAL

Ultralow Loading Pt Nanocatalysts Prepared by Atomic Layer Deposition on Carbon Aerogels

(2008) Jeffrey S. King et al.   NANO LETTERS

Vanadium Oxide Sensing Layer Grown on Carbon Nanotubes by a New Atomic Layer Deposition Process

(2008) Marc-Georg Willinger et al.   NANO LETTERS

General Assembly Method for Linear Metal Nanoparticle Chains Embedded in Nanotubes

(2008) Yong Qin et al.   NANO LETTERS

Radial Electron Collection in Dye-Sensitized Solar Cells

(2008) Alex B. F. Martinson et al.   NANO LETTERS

Quantum confinement in amorphous TiO2films studied via atomic layer deposition

(2008) David M King et al.   NANOTECHNOLOGY

Variation of ZnO shell thickness and its effects on the characteristics of coaxial nanowires

(2008) Hyoun Woo Kim et al.   NANOTECHNOLOGY

Modifying the anti-wetting property of butterfly wings and water strider legs by atomic layer deposition coating: surface materials versus geometry

(2008) Yong Ding et al.   NANOTECHNOLOGY

Large area nanorings fabricated using an atomic layer deposition Al2O3 spacer for magnetic random access memory application

(2008) Yong Luo et al.   NANOTECHNOLOGY

The preparation of reusable magnetic and photocatalytic composite nanofibers by electrospinning and atomic layer deposition

(2008) Eero Santala et al.   NANOTECHNOLOGY

Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition

(2008) Woo-Hee Kim et al.   NANOTECHNOLOGY

Preferential growth of ZnO thin films by the atomic layer deposition technique

(2008) Swee-Yong Pung et al.   NANOTECHNOLOGY

Passivation of pigment-grade TiO2 particles by nanothick atomic layer deposited SiO2 films

(2008) David M King et al.   NANOTECHNOLOGY

Atomic layer deposition of TiO2nanostructures for self-cleaning applications

(2008) Charlene J W Ng et al.   NANOTECHNOLOGY

Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer

(2008) Chih-Yu Chang et al.   ORGANIC ELECTRONICS

Improvement of the contact resistance between ITO and pentacene using various metal-oxide interlayers

(2008) Hyoungsub Kim et al.   ORGANIC ELECTRONICS

Monolayer-precision fabrication of mixed-organic–inorganic nanohybrid superlattices for flexible electronic devices

(2008) Byoung H. Lee et al.   ORGANIC ELECTRONICS

Effects of surface pretreatment on growth of ZnO on glass substrate

(2008) Hisao Makino et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Crossover between two different magnetization reversal modes in arrays of iron oxide nanotubes

(2008) J. Escrig et al.   PHYSICAL REVIEW B

Combined experimental and theoretical study of thin hafnia films

(2008) X. Luo et al.   PHYSICAL REVIEW B

Atomic layer deposition of TiO2 films on particles in a fluidized bed reactor

(2008) David M. King et al.   POWDER TECHNOLOGY

Micromachined resonators of high Q-factor based on atomic layer deposited alumina

(2008) Yuan-Jen Chang et al.   SENSORS AND ACTUATORS A-PHYSICAL

Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition

(2008) X. Du et al.   SENSORS AND ACTUATORS B-CHEMICAL

Atomic layer deposited TiO2 films in photodegradation of aqueous salicylic acid

(2008) Sari Vilhunen et al.   SEPARATION AND PURIFICATION TECHNOLOGY

Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition

(2008) Han-Bo-Ram Lee et al.   Small

Transmission Electron Microscopy in situ Fabrication of ZnO/Al2O3Composite Nanotubes by Electron-Beam-Irradiation-Induced Local Etching of ZnO/Al2O3Core/Shell Nanowires

(2008) Yang Yang et al.   Small

TEM-Based Metrology for HfO2Layers and Nanotubes Formed in Anodic Aluminum Oxide Nanopore Structures

(2008) Israel Perez et al.   Small

Effects of annealing temperature of buffer layer on structural and optical properties of ZnO thin film grown by atomic layer deposition

(2008) C.R. Kim et al.   SOLID STATE COMMUNICATIONS

Preparation of one dimensional Bi2O3-core/ZnO-shell structures by thermal evaporation and atomic layer deposition

(2008) Sunghoon Park et al.   SOLID STATE COMMUNICATIONS

Thin films of MoN, WN, and perfluorinated silane deposited from dimethylamido precursors as contamination resistant coatings on micro-injection mold inserts

(2008) Ville Miikkulainen et al.   SURFACE & COATINGS TECHNOLOGY

Interfacial studies of Al2O3 deposited on 4H-SiC(0001)

(2008) Spyros Diplas et al.   SURFACE AND INTERFACE ANALYSIS

Characterization of lanthanum lutetium oxide thin films grown by atomic layer deposition as an alternative gate dielectric

(2008) M. Roeckerath et al.   THIN SOLID FILMS

Low-temperature atomic layer deposition of ZnO films on particles in a fluidized bed reactor

(2008) David M. King et al.   THIN SOLID FILMS

Nitridation and oxynitridation of Si to control interfacial reaction with HfO2

(2008) Rajesh Katamreddy et al.   THIN SOLID FILMS

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

(2008) Sang-Joon Park et al.   THIN SOLID FILMS

Hydrothermal crystallization of amorphous titania films deposited using low temperature atomic layer deposition

(2008) D.R.G. Mitchell et al.   THIN SOLID FILMS

ALD growth, thermal treatments and characterisation of Al2O3 layers

(2008) E. Ghiraldelli et al.   THIN SOLID FILMS

Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

(2008) Elina Färm et al.   THIN SOLID FILMS

Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen

(2008) Jonathan R. Scheffe et al.   THIN SOLID FILMS

Influence of substrate temperature and Zn-precursors on atomic layer deposition of polycrystalline ZnO films on glass

(2008) Hisao Makino et al.   THIN SOLID FILMS

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS

Etching characteristics of Al2O3 thin films in inductively coupled BCl3/Ar plasma

(2008) Sun Jin Yun et al.   VACUUM

Effect of film composition and structure on the crystallization point of atomic layer deposited HfAlOx using metal (diethylamino) precursors and ozone

(2007) Rajesh Katamreddy et al.   ACTA MATERIALIA

Growth of iron cobaltoxides by atomic layer deposition

(2007) Martin Lie et al.   DALTON TRANSACTIONS

Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

(2007) Xinhua Liang et al.   DIAMOND AND RELATED MATERIALS

TiO[sub 2]∕Al[sub 2]O[sub 3]∕TiO[sub 2] Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition

(2007) Woojin Jeon et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Transparent ZnO-TFT Arrays Fabricated by Atomic Layer Deposition

(2007) Sang-Hee Ko Park et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Biocompatibility of atomic layer-deposited alumina thin films

(2007) Dudley S. Finch et al.   JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART A

Controlling of preferential growth mode of ZnO thin films grown by atomic layer deposition

(2007) A. Wójcik et al.   JOURNAL OF CRYSTAL GROWTH

Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth

(2007) Hugo Tiznado et al.   JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL

Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films

(2007) S. Dueñas et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Composite nanowires with MgO/ZnO core–sheath structures: Study of thin ZnO shell layers

(2007) Hyoun Woo Kim et al.   JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS

Physical and Electrical Properties of Atomic-Layer-Deposited Hf[sub x]Zr[sub 1−x]O[sub 2] with TEMAHf, TEMAZr, and Ozone

(2007) D. H. Triyoso et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Silicon Orientation Effects in the Atomic Layer Deposition of Hafnium Oxide

(2007) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Photocatalytic Activity of Atomic Layer Deposited TiO[sub 2] Coatings on Austenitic Stainless Steels and Copper Alloys

(2007) Hiroshi Kawakami et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

A nanoanalytical investigation of elemental distributions in high-k dielectric gate stacks on silicon

(2007) F.T. Docherty et al.   MICROELECTRONIC ENGINEERING

Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin films

(2007) D. Schmidt et al.   MICROELECTRONIC ENGINEERING

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING

Rayleigh-Instability-Induced Metal Nanoparticle Chains Encapsulated in Nanotubes Produced by Atomic Layer Deposition

(2007) Yong Qin et al.   NANO LETTERS

Improvement in corrosion resistance of CrN coated stainless steel by conformal TiO2 deposition

(2007) C.X. Shan et al.   SURFACE & COATINGS TECHNOLOGY

Corrosion resistance of TiO2 films grown on stainless steel by atomic layer deposition

(2007) C.X. Shan et al.   SURFACE & COATINGS TECHNOLOGY

Molybdenum nitride nanotubes

(2007) Ville Miikkulainen et al.   THIN SOLID FILMS

Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through

(2007) K. Grigoras et al.   THIN SOLID FILMS

Characterization and gas-sensing behavior of an iron oxide thin film prepared by atomic layer deposition

(2007) Mikko Aronniemi et al.   THIN SOLID FILMS

Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

(2007) Indrek Jõgi et al.   THIN SOLID FILMS

Conformal ZnO coatings on high surface area silica gel using atomic layer deposition

(2007) J.A. Libera et al.   THIN SOLID FILMS

Tungsten atomic layer deposition on polymers

(2007) C.A. Wilson et al.   THIN SOLID FILMS

ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor

(2007) S.J. Lim et al.   THIN SOLID FILMS

Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings

(2007) Russell Cooper et al.   THIN SOLID FILMS