An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD

Published 2008 View Full Article

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Title
An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
Authors
Keywords
-
Journal
CHEMICAL VAPOR DEPOSITION
Volume 14, Issue 9-10, Pages 296-302
Publisher
Wiley
Online
2008-10-06
DOI
10.1002/cvde.200806701

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