Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition

Title
Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 1, Pages 226
Publisher
American Vacuum Society
Online
2009-02-11
DOI
10.1116/1.3071844

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