Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application

Published 2010 View Full Article

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Title
Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
Authors
Keywords
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Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 25, Issue 7, Pages 075009
Publisher
IOP Publishing
Online
2010-06-21
DOI
10.1088/0268-1242/25/7/075009

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