TiO[sub 2]∕Al[sub 2]O[sub 3]∕TiO[sub 2] Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition

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Title
TiO[sub 2]∕Al[sub 2]O[sub 3]∕TiO[sub 2] Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 2, Pages H19
Publisher
The Electrochemical Society
Online
2007-12-22
DOI
10.1149/1.2813881

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