Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Properties of AlN grown by plasma enhanced atomic layer deposition

(2011) Markus Bosund et al.   APPLIED SURFACE SCIENCE

Surface Loss in Ozone-Based Atomic Layer Deposition Processes

(2011) Harm C.M. Knoops et al.   CHEMISTRY OF MATERIALS

A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology

(2011) A. Cacciato et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors

(2011) Osama M. Nayfeh et al.   IEEE ELECTRON DEVICE LETTERS

Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD

(2011) Dai Hong Kim et al.   JOURNAL OF CRYSTAL GROWTH

Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

(2011) Seong-Jun Jeong et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time

(2011) Young-Chul Byun et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

(2011) H. B. Profijt et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films

(2011) M. E. Donders et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating

(2011) Chih-Chieh Chang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

(2011) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

(2011) N. Leick et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Development of hafnium based high-k materials—A review

(2011) J.H. Choi et al.   MATERIALS SCIENCE & ENGINEERING R-REPORTS

Silicide-induced multi-wall carbon nanotube growth on silicon nanowires

(2011) J H Lee et al.   NANOTECHNOLOGY

Patterned deposition by plasma enhanced spatial atomic layer deposition

(2011) Paul Poodt et al.   Physica Status Solidi-Rapid Research Letters

Effects of the substrate temperature on the Cu seed layer formed using atomic layer deposition

(2011) Dae-Yong Moon et al.   THIN SOLID FILMS

Effects of vacuum ultraviolet and ultraviolet irradiation on ultrathin hafnium-oxide dielectric layers on (100)Si as measured with electron-spin resonance

(2010) H. Ren et al.   APPLIED PHYSICS LETTERS

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

(2010) N. M. Terlinden et al.   APPLIED PHYSICS LETTERS

Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3

(2010) A. Ali et al.   APPLIED PHYSICS LETTERS

GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

(2010) M. Bosund et al.   APPLIED SURFACE SCIENCE

The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD

(2010) Doyoung Kim et al.   APPLIED SURFACE SCIENCE

Embedding Quantum Dot Monolayers in Al2O3Using Atomic Layer Deposition

(2010) Karel Lambert et al.   CHEMISTRY OF MATERIALS

The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

(2010) S. J. Lim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Plasma-Enhanced Atomic Layer Deposition of TaC[sub x]N[sub y] Films with tert-Butylimido Tris-diethylamido Tantalum and Methane/Hydrogen Gas

(2010) Gi-hee Cho et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition

(2010) Tae-Kwang Eom et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Changes to Charge and Defects in Dielectrics from Ion and Photon Fluences during Plasma Exposure

(2010) H. Ren et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Self-Aligned-Gate ZnO TFT Circuits

(2010) D.A. Mourey et al.   IEEE ELECTRON DEVICE LETTERS

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

(2010) Seok-Jun Won et al.   IEEE ELECTRON DEVICE LETTERS

Fast Flexible Plastic Substrate ZnO Circuits

(2010) Dalong Zhao et al.   IEEE ELECTRON DEVICE LETTERS

Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation

(2010) Byung-Woo Kang et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Plasma-Enhanced Atomic Layer Deposition of Ni

(2010) Han-Bo-Ram Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

(2010) Jae-Min Kim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor

(2010) Tatsunori Murata et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Oxygen migration in TiO2-based higher-k gate stacks

(2010) Stephen L. Brown et al.   JOURNAL OF APPLIED PHYSICS

Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition

(2010) Han-Bo-Ram Lee et al.   JOURNAL OF CRYSTAL GROWTH

Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition

(2010) Yongchan Kim et al.   JOURNAL OF MATERIALS RESEARCH

Lyman–Birge–Hopfield emissions from electron-impact excited N2

(2010) J A Young et al.   JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS

The effects of RF power on the interfacial property between Al2O3and Si3N4and on the memory property in a MANOS structure

(2010) Hyungchul Kim et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al[sub 2]O[sub 3] and ZnO for Transparent Thin Film Transistor Applications

(2010) Sung-Min Yoon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaN[sub x] on Adhesion with Copper

(2010) Chih-Chieh Chang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

The Effects of Annealing Ambient on the Characteristics of La[sub 2]O[sub 3] Films Deposited by RPALD

(2010) Hyungchul Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

(2010) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH[sub 3] Plasma

(2010) Windu Sari et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Remote Plasma ALD of SrTiO[sub 3] Using Cyclopentadienlyl-Based Ti and Sr Precursors

(2010) E. Langereis et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO[sub 2] Thin Films

(2010) Hyungchul Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films

(2010) K. B. Jinesh et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Mono-Energetic Neutron Source by 7Li(p,n)7Be Reaction

(2010) Kim gi Dong   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

?The Degradation of Deposition Blocking Layer during Area Selective Plasma Enhanced Atomic Layer Deposition of Cobalt

(2010) Hyungjun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Optical and Electrical Properties of AlxTi1-xO Films

(2010) Jung Wook Lim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Investigating the TiN Film Quality and Growth Behavior for Plasma-enhanced Atomic Layer Deposition Using TiCl$_4$ and N$_2$/H$_2$/Ar Radicals

(2010) Jin-seong Park et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Multiferroic Properties of Bismuth Layer Structured Bi3.25La0.75Ti3O12-(La0.7 Sr0.3)MnO3 Solid Solution at Low Temperature

(2010) Jeong Seog Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition

(2010) Qi Xie et al.   MICROELECTRONIC ENGINEERING

A low-temperature-grown TiO2-based device for the flexible stacked RRAM application

(2010) Hu Young Jeong et al.   NANOTECHNOLOGY

Bipolar resistive switching in amorphous titanium oxide thin film

(2010) Hu Young Jeong et al.   Physica Status Solidi-Rapid Research Letters

Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2gate stacks

(2010) J Hinz et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application

(2010) J Hinz et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations

(2010) Dai Hong Kim et al.   SENSORS AND ACTUATORS B-CHEMICAL

Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils

(2010) Jaehyun Moon et al.   SOLID-STATE ELECTRONICS

Self-limiting growth of anatase TiO2: A comparison of two deposition techniques

(2010) Nicholas G. Kubala et al.   THIN SOLID FILMS

Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

(2010) Chang-Soo Lee et al.   THIN SOLID FILMS

Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

(2010) Woo-Hee Kim et al.   THIN SOLID FILMS

Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition

(2009) Chang-Soo Lee et al.   APPLIED CATALYSIS B-ENVIRONMENTAL

Effect of thermal annealing on charge exchange between oxygen interstitial defects within HfO2 and oxygen-deficient silicon centers within the SiO2/Si interface

(2009) J. L. Lauer et al.   APPLIED PHYSICS LETTERS

Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

(2009) W. M. M. Kessels et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc

(2009) Pieter C. Rowlette et al.   CHEMICAL VAPOR DEPOSITION

Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition

(2009) Byung Joon Choi et al.   CHEMISTRY OF MATERIALS

Influence of annealing duration on optical property and surface morphology of ZnO thin film grown by atomic layer deposition

(2009) C.R. Kim et al.   CURRENT APPLIED PHYSICS

Enhancement of the TiO[sub 2] Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate

(2009) Dae-Kwon Joo et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Remote Plasma ALD of Platinum and Platinum Oxide Films

(2009) H. C. M. Knoops et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N[sub 2]O Gas

(2009) Seok-Jun Won et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Fabrication and Properties of AlN Film on GaN Substrate by Using Remote Plasma Atomic Layer Deposition Method

(2009) Kwang-Ho Kim et al.   Electronic Materials Letters

Optical and Electrical Properties of Ti<SUB>x</SUB>Si<SUB>1-x</SUB>O<SUB>y</SUB> Films

(2009) Jung Wook Lim et al.   ETRI JOURNAL

Performance Improvement of N-Type $\hbox{TiO}_{x}$ Active-Channel TFTs Grown by Low-Temperature Plasma-Enhanced ALD

(2009) Jae-Woo Park et al.   IEEE ELECTRON DEVICE LETTERS

Improvement of On–Off-Current Ratio in $ \hbox{TiO}_{\rm x}$ Active-Channel TFTs Using $\hbox{N}_{2} \hbox{O}$ Plasma Treatment

(2009) Jae-Woo Park et al.   IEEE ELECTRON DEVICE LETTERS

Fast PEALD ZnO Thin-Film Transistor Circuits

(2009) Devin A. Mourey et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Bis(cyclopentadienyl) zirconium(IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD

(2009) Stephen E. Potts et al.   INORGANICA CHIMICA ACTA

Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications

(2009) D. Hoogeland et al.   JOURNAL OF APPLIED PHYSICS

Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

(2009) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4

(2009) Nicholas G. Kubala et al.   Journal of Physical Chemistry C

Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films

(2009) C. Hossbach et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]

(2009) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications

(2009) L. Wu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

(2009) Gyu-Jin Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Thermal and Plasma Enhanced Atomic Layer Deposition of Al[sub 2]O[sub 3] on GaAs Substrates

(2009) Sonja Sioncke et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

HfO[sub 2]/HfO[sub x]N[sub y]/HfO[sub 2] Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer

(2009) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

(2009) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

(2009) J. Musschoot et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation

(2009) Seokhoon Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer

(2009) Hyungseok Hong et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Effects of Confinement on the Valley Splitting of Si Quantum Structures

(2009) S. N. Ko et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films

(2009) Woong-Sun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric

(2009) Hyeong-Seon Yun et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Interface Properties of Nickel-silicide Films Deposited by UsingPlasma-assisted Atomic Layer Deposition

(2009) Kwang-Man Lee et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor

(2009) Dae-Yong Moon et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2

(2009) Junghoon Joo et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications

(2009) Sumit Kumar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition

(2009) Pieter C. Rowlette et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

(2009) A. J. M. Mackus et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Development of plasma-enhanced atomic layer deposition grown Ru–WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications

(2009) D. Greenslit et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning (Invited Paper)

(2009) Matty Caymax et al.   MICROELECTRONIC ENGINEERING

High-k dielectrics for future generation memory devices (Invited Paper)

(2009) J.A. Kittl et al.   MICROELECTRONIC ENGINEERING

Texture of atomic layer deposited ruthenium

(2009) J. Musschoot et al.   MICROELECTRONIC ENGINEERING

Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition

(2009) Bum Ho Choi et al.   MICROELECTRONIC ENGINEERING

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Plasma-Assisted Atomic Layer Deposition of Al2O3at Room Temperature

(2009) Tommi O. Kääriäinen et al.   Plasma Processes and Polymers

Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment

(2009) Dong Jin Park et al.   SOLID-STATE ELECTRONICS

Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films

(2009) Woong-Sun Kim et al.   THIN SOLID FILMS

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

(2009) Qi Xie et al.   THIN SOLID FILMS

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

(2008) Hyeongtag Jeon et al.   APPLIED PHYSICS LETTERS

Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties

(2008) Moon-Kyun Song et al.   CHEMICAL VAPOR DEPOSITION

An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD

(2008) Michael T. Seman et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2and Ozone

(2008) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application

(2008) Sung-Soo Yim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper

(2008) L. Wu et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process

(2008) Sung-Wook Kim et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Enhanced Dielectric Properties of SrTiO[sub 3] Films with a SrRuO[sub 3] Seed by Plasma-Enhanced Atomic Layer Deposition

(2008) Ji-Hoon Ahn et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique

(2008) Sanghyun Woo et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Optical AlxTi1-xOyFilms Grown by Plasma Enhanced Atomic Layer Deposition

(2008) Jung Wook Lim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation

(2008) W. J. Maeng et al.   JOURNAL OF APPLIED PHYSICS

Silicon surface passivation by atomic layer deposited Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

Titanium Dioxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition for OLED Passivation

(2008) Woong-Sun Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

(2008) Qi Xie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

(2008) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD

(2008) Sung-Wook Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N[sub 2] and N[sub 2]O Plasma Post-Treatments

(2008) Hyungchul Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition

(2008) Se-Hun Kwon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications

(2008) Steven Consiglio et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Electrical Properties of Atomic Layer Deposition HfO[sub 2] and HfO[sub x]N[sub y] on Si Substrates with Various Crystal Orientations

(2008) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient

(2008) Pierre Caubet et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of Sr–Ruthenate Seed Layer on Dielectric Properties of SrTiO[sub 3] Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

(2008) Ji-Hoon Ahn et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine

(2008) B. B. Burton et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia

(2008) Moon-Kyun Song et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

(2008) S. B. S. Heil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition

(2008) Jiurong Liu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Optical second-harmonic generation in thin film systems

(2008) J. J. H. Gielis et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma

(2008) Qi Xie et al.   MICROELECTRONIC ENGINEERING

Characterization of Nitrogen Glow Discharge Plasma via Optical Emission Spectrum Simulation

(2008) Zhang Lianzhu et al.   PLASMA SCIENCE & TECHNOLOGY

Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition

(2008) Han-Bo-Ram Lee et al.   Small

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING

Corrosion resistance of TiO2 films grown on stainless steel by atomic layer deposition

(2007) C.X. Shan et al.   SURFACE & COATINGS TECHNOLOGY