Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

Published 2008 View Full Article

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Title
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 3, Pages 472-480
Publisher
American Vacuum Society
Online
2008-05-14
DOI
10.1116/1.2905250

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