Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer

Published 2009 View Full Article

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Title
Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
Authors
Keywords
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Journal
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 52, Issue 4, Pages 1114-1119
Publisher
Korean Physical Society
Online
2009-06-26
DOI
10.3938/jkps.52.1114

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