Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper

Title
Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 5, Pages H107
Publisher
The Electrochemical Society
Online
2008-03-15
DOI
10.1149/1.2844207

Ask authors/readers for more resources

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search