Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
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Title
Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 7, Pages P66
Publisher
The Electrochemical Society
Online
2010-05-29
DOI
10.1149/1.3428705
References
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- (2009) H. C. M. Knoops et al. ELECTROCHEMICAL AND SOLID STATE LETTERS
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- (2008) David M King et al. NANOTECHNOLOGY
- Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer
- (2008) Chih-Yu Chang et al. ORGANIC ELECTRONICS
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