Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum

Published 2010 View Full Article

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Title
Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 6, Pages H652
Publisher
The Electrochemical Society
Online
2010-05-04
DOI
10.1149/1.3377003
References
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