Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices

Published 2009 View Full Article

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Title
Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 3, Pages 373-378
Publisher
Elsevier BV
Online
2009-06-27
DOI
10.1016/j.mee.2009.06.015

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