Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Published 2010 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 257, Issue 3, Pages 1043-1052
Publisher
Elsevier BV
Online
2010-08-07
DOI
10.1016/j.apsusc.2010.07.105

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.