Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates

Title
Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 3, Pages G9
Publisher
The Electrochemical Society
Online
2008-01-24
DOI
10.1149/1.2825763

Ask authors/readers for more resources

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started