Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide

Published 2010 View Full Article

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Title
Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide
Authors
Keywords
-
Journal
LANGMUIR
Volume 26, Issue 6, Pages 3911-3917
Publisher
American Chemical Society (ACS)
Online
2010-01-22
DOI
10.1021/la903212c

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