Mechanisms of Atomic Layer Deposition on Substrates with Ultrahigh Aspect Ratios

Published 2008 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Mechanisms of Atomic Layer Deposition on Substrates with Ultrahigh Aspect Ratios
Authors
Keywords
-
Journal
LANGMUIR
Volume 24, Issue 3, Pages 943-948
Publisher
American Chemical Society (ACS)
Online
2008-01-01
DOI
10.1021/la7018617

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.