Characteristics of La$_2$O$_3$ Thin Films Deposited Using the ECR Atomic Layer Deposition Method

Published 2009 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Characteristics of La$_2$O$_3$ Thin Films Deposited Using the ECR Atomic Layer Deposition Method
Authors
Keywords
-
Journal
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 55, Issue 2, Pages 590-593
Publisher
Korean Physical Society
Online
2009-08-12
DOI
10.3938/jkps.55.590

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.