Growth and interface of HfO2 films on H-terminated Si from a TDMAH and H2O atomic layer deposition process

Title
Growth and interface of HfO2 films on H-terminated Si from a TDMAH and H2O atomic layer deposition process
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 5, Pages 1235-1240
Publisher
American Vacuum Society
Online
2008-09-13
DOI
10.1116/1.2965813

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