Atomic layer deposited (ALD) TiO2 and TiO2−x-Nx thin film photocatalysts in salicylic acid decomposition

Published 2009 View Full Article

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Title
Atomic layer deposited (ALD) TiO2 and TiO2−x-Nx thin film photocatalysts in salicylic acid decomposition
Authors
Keywords
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Journal
WATER SCIENCE AND TECHNOLOGY
Volume 60, Issue 10, Pages 2471-2475
Publisher
IWA Publishing
Online
2009-11-20
DOI
10.2166/wst.2009.660

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