Atomic Layer Deposition of MgF2Thin Films Using TaF5as a Novel Fluorine Source

Published 2008 View Full Article

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Title
Atomic Layer Deposition of MgF2Thin Films Using TaF5as a Novel Fluorine Source
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 20, Issue 15, Pages 5023-5028
Publisher
American Chemical Society (ACS)
Online
2008-06-21
DOI
10.1021/cm800948k

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