Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

Temperature dependence of the sticking coefficient in atomic layer deposition

(2010) M. Rose et al.   APPLIED SURFACE SCIENCE

Uptake of Gaseous Hydrogen Peroxide by Submicrometer Titanium Dioxide Aerosol as a Function of Relative Humidity

(2010) Manik Pradhan et al.   ENVIRONMENTAL SCIENCE & TECHNOLOGY

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

(2010) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Method to determine the sticking coefficient of precursor molecules in atomic layer deposition

(2009) M. Rose et al.   APPLIED SURFACE SCIENCE

Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4

(2009) Nicholas G. Kubala et al.   Journal of Physical Chemistry C

Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications

(2009) L. Wu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Study on Atomic Layer Deposition of Amorphous Rhodium Oxide Thin Films

(2009) Jani Hämäläinen et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

(2009) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

TEM-Based Metrology for HfO2Layers and Nanotubes Formed in Anodic Aluminum Oxide Nanopore Structures

(2008) Israel Perez et al.   Small