HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle

Title
HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 12, Pages G269
Publisher
The Electrochemical Society
Online
2008-10-29
DOI
10.1149/1.2980427

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