Nitridation and oxynitridation of Si to control interfacial reaction with HfO2

Published 2008 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Nitridation and oxynitridation of Si to control interfacial reaction with HfO2
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 516, Issue 23, Pages 8498-8506
Publisher
Elsevier BV
Online
2008-05-17
DOI
10.1016/j.tsf.2008.05.002

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.