Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties

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Title
Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
Authors
Keywords
-
Journal
CHEMICAL VAPOR DEPOSITION
Volume 14, Issue 11-12, Pages 334-338
Publisher
Wiley
Online
2008-12-19
DOI
10.1002/cvde.200806702

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