Complete band offset characterization of the HfO2/SiO2/Si stack using charge corrected x-ray photoelectron spectroscopy

High resolution photoemission study of SiOx/Si(111) interface disruption following in situ HfO2 deposition

(2009) Stephen McDonnell et al.   APPLIED PHYSICS LETTERS

Origin of electric dipoles formed at high-k/SiO2 interface

(2009) Koji Kita et al.   APPLIED PHYSICS LETTERS

Electrical and Chemical Properties of the HfO[sub 2]/SiO[sub 2]/Si Stack: Impact of HfO[sub 2] Thickness and Thermal Budget

(2009) E. Martinez et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic mechanism of flat-band voltage shifts at La2O3, Al2O3 and Nb2O5 capping layers

(2009) L. Lin et al.   MICROELECTRONIC ENGINEERING

Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning

(2008) P. D. Kirsch et al.   APPLIED PHYSICS LETTERS

Experimental evidence for the flatband voltage shift of high-k metal-oxide-semiconductor devices due to the dipole formation at the high-k∕SiO2 interface

(2008) Kunihiko Iwamoto et al.   APPLIED PHYSICS LETTERS

Internal Photoemission over HfO2and Hf(1-x)SixO2High-kInsulating Barriers: Band Offset and Interfacial Dipole Characterization

(2008) Julie Widiez et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Observation of band bending of metal/high-k Si capacitor with high energy x-ray photoemission spectroscopy and its application to interface dipole measurement

(2008) K. Kakushima et al.   JOURNAL OF APPLIED PHYSICS

The relationship between local order, long range order, and sub-band-gap defects in hafnium oxide and hafnium silicate films

(2008) D. H. Hill et al.   JOURNAL OF APPLIED PHYSICS

Effects of aluminum incorporation on band alignment at theSiO2∕HfO2interface

(2008) Onise Sharia et al.   PHYSICAL REVIEW B

Band offsets of ultrathin high-κoxide films with Si

(2008) Eric Bersch et al.   PHYSICAL REVIEW B

Analysis of x-ray irradiation effect in high-kgate dielectrics by time-dependent photoemission spectroscopy using synchrotron radiation

(2008) T. Tanimura et al.   SURFACE AND INTERFACE ANALYSIS