Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]

Published 2009 View Full Article

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Title
Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]
Authors
Keywords
-
Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 156, Issue 5, Pages G33
Publisher
The Electrochemical Society
Online
2009-04-01
DOI
10.1149/1.3089976
References
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