Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

Title
Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 2, Pages 244-252
Publisher
American Vacuum Society
Online
2008-08-08
DOI
10.1116/1.2835087

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search