Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

Published 2010 View Full Article

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Title
Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 519, Issue 1, Pages 362-366
Publisher
Elsevier BV
Online
2010-08-04
DOI
10.1016/j.tsf.2010.07.108

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