Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

Published 2008 View Full Article

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Title
Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 8, Pages G163
Publisher
The Electrochemical Society
Online
2008-07-11
DOI
10.1149/1.2946431

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