Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate

Published 2008 View Full Article

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Title
Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 19, Pages 192902
Publisher
AIP Publishing
Online
2008-11-11
DOI
10.1063/1.2996261
References
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