Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

Authors

Keywords

Journal

Volume 156, Issue 9, Pages G138

Publisher

The Electrochemical Society

Online

2009-07-25

DOI

10.1149/1.3169516

References

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