Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films

ADVANCED MATERIALS 20THANNIVERSARY

(2008)   ADVANCED MATERIALS

Effects of nitrogen atom doping on optical properties and dielectric constant of HfO2 gate oxides

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Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

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The effect of dopants on the dielectric constant of HfO[sub 2] and ZrO[sub 2] from first principles

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Morphology and Composition of Selected High-k Materials and Their Relevance to Dielectric Properties of Thin Films

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First-principles study on doping and phase stability ofHfO2

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