HfO[sub 2]∕Si interface formation in atomic layer deposition films: An in situ investigation

Published 2009 View Full Article

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Title
HfO[sub 2]∕Si interface formation in atomic layer deposition films: An in situ investigation
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 1, Pages 300
Publisher
American Vacuum Society
Online
2009-02-12
DOI
10.1116/1.3021023
References
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