Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

Published 2010 View Full Article

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Title
Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 49, Issue 5, Pages 05FA10
Publisher
Japan Society of Applied Physics
Online
2010-05-20
DOI
10.1143/jjap.49.05fa10

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