Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High- k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride
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Title
Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-
k
Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride
Authors
Keywords
-
Journal
ECS Journal of Solid State Science and Technology
Volume 6, Issue 10, Pages N189-N208
Publisher
The Electrochemical Society
Online
2017-10-06
DOI
10.1149/2.0091710jss
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