High-K materials and metal gates for CMOS applications

Published 2015 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
High-K materials and metal gates for CMOS applications
Authors
Keywords
High K oxide, Gate oxide, HfO, 2, Field effect transistor, CMOS
Journal
MATERIALS SCIENCE & ENGINEERING R-REPORTS
Volume 88, Issue -, Pages 1-41
Publisher
Elsevier BV
Online
2014-12-10
DOI
10.1016/j.mser.2014.11.001

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.