Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Title
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 558, Issue -, Pages 93-98
Publisher
Elsevier BV
Online
2014-03-14
DOI
10.1016/j.tsf.2014.02.087

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