Plasma enhanced atomic layer deposition of SiNx:H and SiO2

Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH2Cl2and O3

(2010) Won-Jun Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Langmuir Probe and Optical Emission Spectroscopy Studies of Low-Pressure Gas Mixture of CO2and N2

(2010) E. F Mendez-Martinez et al.   PLASMA SCIENCE & TECHNOLOGY

Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiNx:H films

(2010) Sean King et al.   THIN SOLID FILMS

Intrinsic stress fracture energy measurements for PECVD thin films in the SiOxCyNz:H system

(2009) S.W. King et al.   MICROELECTRONICS RELIABILITY

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

(2008) Julien Bachmann et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress

(2008) M. Belyansky et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A