High etch selectivity for plasma etching SiO2 with AlN and Al2O3 masks

Published 2008 View Full Article

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Title
High etch selectivity for plasma etching SiO2 with AlN and Al2O3 masks
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 5-6, Pages 985-987
Publisher
Elsevier BV
Online
2008-01-05
DOI
10.1016/j.mee.2007.12.037

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