Detection of surface electronic defect states in low and high-k dielectrics using reflection electron energy loss spectroscopy

Experimental evidence and modeling of two types of electron traps in Al2O3 for nonvolatile memory applications

(2013) L. Sambuco Salomone et al.   JOURNAL OF APPLIED PHYSICS

Detection of defect states in low-k dielectrics using reflection electron energy loss spectroscopy

(2013) S.W. King et al.   JOURNAL OF APPLIED PHYSICS

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Native point defects and dangling bonds in α-Al2O3

(2013) Minseok Choi et al.   JOURNAL OF APPLIED PHYSICS

Electron spin resonance signature of the oxygen vacancy in HfO2

(2012) R. Gillen et al.   APPLIED PHYSICS LETTERS

Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass

(2012) M. T. Nichols et al.   APPLIED PHYSICS LETTERS

Defect level distributions and atomic relaxations induced by charge trapping in amorphous silica

(2012) Nathan L. Anderson et al.   APPLIED PHYSICS LETTERS

Valence band offset at the amorphous hydrogenated boron nitride-silicon (100) interface

(2012) S. W. King et al.   APPLIED PHYSICS LETTERS

First principles study of the oxygen vacancy formation and the induced defect states in hafnium silicates

(2012) Tsung-Ju Chen et al.   JOURNAL OF APPLIED PHYSICS

The effects of vacuum ultraviolet radiation on low-kdielectric films

(2012) H. Sinha et al.   JOURNAL OF APPLIED PHYSICS

Mechanical properties of high porosity low-kdielectric nano-films determined by Brillouin light scattering

(2012) S Bailey et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Interaction between graphene and the surface of SiO2

(2012) X F Fan et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

The electronic structure and optical response of rutile, anatase and brookite TiO2

(2012) M Landmann et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Time dependent dielectric breakdown physics – Models revisited

(2012) J.W. McPherson   MICROELECTRONICS RELIABILITY

Effect of nitrogen incorporation and oxygen vacancy on electronic structure and the absence of a gap state in HfSiO films

(2012) Moon Hyung Jang et al.   SURFACE SCIENCE

Film Property Requirements for Hermetic Low-k a-SiOxCyNz:H Dielectric Barriers

(2012) S. W. King et al.   ECS Journal of Solid State Science and Technology

Nanometer scale study of HfO2 trap states using single electron tunneling force spectroscopy

(2011) D. W. Winslow et al.   APPLIED PHYSICS LETTERS

Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials

(2011) Larry Zhao et al.   APPLIED PHYSICS LETTERS

Defects in low-k organosilicate glass and their response to processing as measured with electron-spin resonance

(2011) H. Ren et al.   APPLIED PHYSICS LETTERS

The nature of the defects generated from plasma exposure in pristine and ultraviolet-cured low-k organosilicate glass

(2011) H. Ren et al.   APPLIED PHYSICS LETTERS

X-ray photoelectron spectroscopy investigation of the Schottky barrier at low-k a-SiO(C):H/Cu interfaces

(2011) S. W. King et al.   APPLIED PHYSICS LETTERS

Electrical transport properties of graphene on SiO2 with specific surface structures

(2011) K. Nagashio et al.   JOURNAL OF APPLIED PHYSICS

Chemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy

(2011) Hiroshi Yamamoto et al.   JOURNAL OF APPLIED PHYSICS

Ultrathin ALD-Al2O3 layers for Ge(001) gate stacks: Local composition evolution and dielectric properties

(2011) Shankar Swaminathan et al.   JOURNAL OF APPLIED PHYSICS

Native defects in Al2O3 and their impact on III-V/Al2O3 metal-oxide-semiconductor-based devices

(2011) J. R. Weber et al.   JOURNAL OF APPLIED PHYSICS

Electron spin resonance study of defects in low-κ oxide insulators (κ=2.5–2.0)

(2011) V.V. Afanas’ev et al.   MICROELECTRONIC ENGINEERING

Moore’s crystal ball: Device physics and technology past the 15nm generation

(2011) Kelin J. Kuhn   MICROELECTRONIC ENGINEERING

Ultimate Scaling of CMOS Logic Devices with Ge and III–V Materials

(2011) M. Heyns et al.   MRS BULLETIN

A role for graphene in silicon-based semiconductor devices

(2011) Kinam Kim et al.   NATURE

Interfacial interactions between local defects in amorphous SiO2and supported graphene

(2011) A. N. Rudenko et al.   PHYSICAL REVIEW B

Urbach tails of amorphous silicon

(2011) D. A. Drabold et al.   PHYSICAL REVIEW B

First-Principles Calculations of the Urbach Tail in the Optical Absorption Spectra of Silica Glass

(2011) B. Sadigh et al.   PHYSICAL REVIEW LETTERS

Determination of energy and spatial distributions of traps in ultrathin dielectrics by use of inelastic electron tunneling spectroscopy

(2010) Zuoguang Liu et al.   APPLIED PHYSICS LETTERS

Modeling of leakage currents in high-κ dielectrics: Three-dimensional approach via kinetic Monte Carlo

(2010) Gunther Jegert et al.   APPLIED PHYSICS LETTERS

Ultraviolet radiation effects on paramagnetic defects in low-κ dielectrics for ultralarge scale integrated circuit interconnects

(2010) B. C. Bittel et al.   APPLIED PHYSICS LETTERS

Band offsets determination and interfacial chemical properties of the Al2O3/GaSb system

(2010) I. Geppert et al.   APPLIED PHYSICS LETTERS

Oxygen vacancy levels and electron transport in Al2O3

(2010) D. Liu et al.   APPLIED PHYSICS LETTERS

A New Multipulse Technique for Probing Electron Trap Energy Distribution in High- $\kappa$ Materials for Flash Memory Application

(2010) Xue Feng Zheng et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

A Novel Trapping/Detrapping Model for Defect Profiling in High- $k$ Materials Using the Two-Pulse Capacitance–Voltage Technique

(2010) D. Ruiz Aguado et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Fully Integrated Graphene and Carbon Nanotube Interconnects for Gigahertz High-Speed CMOS Electronics

(2010) Xiangyu Chen et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Detrapping dynamics in Al2O3 metal-oxide-semiconductor

(2010) Rosario Rao et al.   JOURNAL OF APPLIED PHYSICS

Soft breakdown characteristics of ultralow-k time-dependent dielectric breakdown for advanced complementary metal-oxide semiconductor technologies

(2010) Fen Chen et al.   JOURNAL OF APPLIED PHYSICS

Electronic and optical properties of Al2O3/SiO2thin films grown on Si substrate

(2010) Dahlang Tahir et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Charge Trapping within UV and Vacuum UV Irradiated Low-k Porous Organosilicate Dielectrics

(2010) J. L. Lauer et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Paramagnetic Defect Generation and Microstructure Change in Porous Low-k SiOCH Films with Vacuum Baking

(2010) Kenji Tanbara et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of porogen residue on electrical characteristics of ultra low-k materials

(2010) Mikhail R. Baklanov et al.   MICROELECTRONIC ENGINEERING

Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiNx:H films

(2010) Sean King et al.   THIN SOLID FILMS

Energy-band parameters of atomic layer deposited Al2O3 and HfO2 on InxGa1−xAs

(2009) M. L. Huang et al.   APPLIED PHYSICS LETTERS

Low Dielectric Constant Materials

(2009) Willi Volksen et al.   CHEMICAL REVIEWS

Resistivity of Graphene Nanoribbon Interconnects

(2009) Raghunath Murali et al.   IEEE ELECTRON DEVICE LETTERS

Reliability Challenges for CMOS Technology Qualifications With Hafnium Oxide/Titanium Nitride Gate Stacks

(2009) A. Kerber et al.   IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

A model for electric degradation of interconnect low-k dielectrics in microelectronic integrated circuits

(2009) Gaddi S. Haase   JOURNAL OF APPLIED PHYSICS

Electron paramagnetic resonance characterization of defects in monoclinic HfO2 and ZrO2 powders

(2009) Sandra Wright et al.   JOURNAL OF APPLIED PHYSICS

Identification of interfacial defects in high-k gate stack films by spectroscopic ellipsometry

(2009) J. Price et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Electron paramagnetic resonance characterization of defects in HfO[sub 2] and ZrO[sub 2] powders and films

(2009) R. C. Barklie et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Challenges of integration of high-κ dielectric with III–V materials (Invited Paper)

(2009) W. Tsai et al.   MICROELECTRONIC ENGINEERING

The evolution of optical and electrical properties of low-k dielectrics under bias stress

(2009) J.M. Atkin et al.   MICROELECTRONIC ENGINEERING

Intrinsic stress fracture energy measurements for PECVD thin films in the SiOxCyNz:H system

(2009) S.W. King et al.   MICROELECTRONICS RELIABILITY

Charge trapping at the low-k dielectric-silicon interface probed by the conductance and capacitance techniques

(2008) J. M. Atkin et al.   APPLIED PHYSICS LETTERS

Change in band alignment of HfO[sub 2] films with annealing treatments

(2008) C. J. Yim et al.   APPLIED PHYSICS LETTERS

Addressing Cu/Low-$k$ Dielectric TDDB-Reliability Challenges for Advanced CMOS Technologies

(2008) Fen Chen et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Photocurrent spectroscopy of low-k dielectric materials: Barrier heights and trap densities

(2008) J. M. Atkin et al.   JOURNAL OF APPLIED PHYSICS

Conduction Mechanisms of Ta/Porous SiCOH Films under Electrical Bias

(2008) Ya Ou et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characterization of low-k SiOCH dielectric for 45nm technology and link between the dominant leakage path and the breakdown localization

(2008) M. Vilmay et al.   MICROELECTRONIC ENGINEERING

Oxygen vacancies in cubicZrO2nanocrystals studied by anab initioembedded cluster method

(2008) D. Muñoz Ramo et al.   PHYSICAL REVIEW B

Electronic structure of point defects in controlled self-doping of theTiO2(110) surface: Combined photoemission spectroscopy and density functional theory study

(2008) Michael Nolan et al.   PHYSICAL REVIEW B

Band offsets of ultrathin high-κoxide films with Si

(2008) Eric Bersch et al.   PHYSICAL REVIEW B

Atomistic Origin of Urbach Tails in Amorphous Silicon

(2008) Y. Pan et al.   PHYSICAL REVIEW LETTERS

Electrical conduction and TDDB reliability characterization for low-k SiCO dielectric in Cu interconnects

(2008) Robin C.J. Wang et al.   THIN SOLID FILMS

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS