Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor

Low-temperature atomic layer deposition of Al2O3 thin coatings for corrosion protection of steel: Surface and electrochemical analysis

(2011) Belén Díaz et al.   CORROSION SCIENCE

The study of thermal silicon dioxide electrets formed by corona discharge and rapid-thermal annealing

(2011) Teng C. Kho et al.   JOURNAL OF APPLIED PHYSICS

Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

(2011) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Impact of parasitic reactions on wafer-scale uniformity in water-based and ozone-based atomic layer deposition

(2011) Laurent Henn-Lecordier et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation

(2010) Paul Poodt et al.   ADVANCED MATERIALS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Dependence of the Decomposition of Trimethylaluminum on Oxygen Concentration

(2010) Satoru Yamashita et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Low voltage organic devices and circuits with aluminum oxide thin film dielectric layer

(2010) LiWei Shang et al.   Science China-Technological Sciences

Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide

(2009) Pierre Saint-Cast et al.   APPLIED PHYSICS LETTERS

Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

(2009) Vikrant R. Rai et al.   Journal of Physical Chemistry C

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Physical and electrical characterizations of metal-oxide-semiconductor capacitors fabricated on GaAs substrates with different surface chemical treatments and Al[sub 2]O[sub 3] gate dielectric

(2009) Domingo I. Garcia-Gutierrez et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide

(2009) Tsu-Tsung Li et al.   Physica Status Solidi-Rapid Research Letters

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High-κ Dielectrics Using Ozone

(2008) Jinhee Kwon et al.   CHEMISTRY OF MATERIALS

Silicon surface passivation by atomic layer deposited Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films

(2008) Jaakko Niinistö et al.   JOURNAL OF MATERIALS CHEMISTRY

Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide

(2008) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

(2008) J. Schmidt et al.   PROGRESS IN PHOTOVOLTAICS