Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films

Title
Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 110, Issue 4, Pages 043527
Publisher
AIP Publishing
Online
2011-08-30
DOI
10.1063/1.3627155

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