Working gas effect on properties of Al 2 O 3 film in plasma-enhanced atomic layer deposition

Title
Working gas effect on properties of Al 2 O 3 film in plasma-enhanced atomic layer deposition
Authors
Keywords
Al, 2, O, 3, film, Working gas effect, Optical emission spectroscopy, Plasma-enhanced atomic layer deposition, SiO, x, interlayer
Journal
THIN SOLID FILMS
Volume 619, Issue -, Pages 342-346
Publisher
Elsevier BV
Online
2016-10-22
DOI
10.1016/j.tsf.2016.10.036

Ask authors/readers for more resources

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now