Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High- k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride

Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

(2017) Shailesh Dhungana et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High-k oxides by atomic layer deposition—Applications in biology and medicine

(2017) Marek Godlewski et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Sustained Sub-60 mV/decade Switching via the Negative Capacitance Effect in MoS2 Transistors

(2017) Felicia A. McGuire et al.   NANO LETTERS

Dual-functional crystalline BeO layer in enhancement-mode ZnO/Si thin film transistors

(2017) Huili Liang et al.   Physica Status Solidi-Rapid Research Letters

Breaking network connectivity leads to ultralow thermal conductivities in fully dense amorphous solids

(2016) Jeffrey L. Braun et al.   APPLIED PHYSICS LETTERS

Spin transport, magnetoresistance, and electrically detected magnetic resonance in amorphous hydrogenated silicon nitride

(2016) Michael J. Mutch et al.   APPLIED PHYSICS LETTERS

Mechanical properties of low- and high-kdielectric thin films: A surface Brillouin light scattering study

(2016) J. Zizka et al.   JOURNAL OF APPLIED PHYSICS

Measurement of the band gap by reflection electron energy loss spectroscopy

(2016) Maarten Vos et al.   JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA

Optical conductivity tuning and electrical properties of a-Be x Zn y O thin films

(2016) J.M. Khoshman et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

(2016) Mikael Broas et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

(2016) Maria Berdova et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability

(2016) Michael J. Mutch et al.   MICROELECTRONICS RELIABILITY

Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check

(2016) W.A. Lanford et al.   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

Working gas effect on properties of Al 2 O 3 film in plasma-enhanced atomic layer deposition

(2016) M. Hur et al.   THIN SOLID FILMS

Improved high temperature integration of Al2O3 on MoS2 by using a metal oxide buffer layer

(2015) Seokki Son et al.   APPLIED PHYSICS LETTERS

Low stiffness tactile transducers based on AlN thin film and polyimide

(2015) V. M. Mastronardi et al.   APPLIED PHYSICS LETTERS

Engineering the mechanical properties of ultrabarrier films grown by atomic layer deposition for the encapsulation of printed electronics

(2015) A. Bulusu et al.   JOURNAL OF APPLIED PHYSICS

Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

(2015) Halit Altuntas et al.   JOURNAL OF APPLIED PHYSICS

Structural and optical characterization of low-temperature ALD crystalline AlN

(2015) P. Motamedi et al.   JOURNAL OF CRYSTAL GROWTH

High-K materials and metal gates for CMOS applications

(2015) John Robertson et al.   MATERIALS SCIENCE & ENGINEERING R-REPORTS

Impact of film thickness and temperature on the dielectric breakdown behavior of sputtered aluminum nitride thin films

(2015) M. Schneider et al.   MICROELECTRONIC ENGINEERING

Multiferroic magnetoelectric nanostructures for novel device applications

(2015) Jia-Mian Hu et al.   MRS BULLETIN

Nanoscale Buckling of Ultrathin Low-k Dielectric Lines during Hard-Mask Patterning

(2015) Gheorghe Stan et al.   NANO LETTERS

Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition

(2015) Taivo Jõgiaas et al.   SURFACE & COATINGS TECHNOLOGY

Mechanical properties of atomic layer deposited Al 2 O 3 /ZnO nanolaminates

(2015) Tomáš Homola et al.   SURFACE & COATINGS TECHNOLOGY

Aluminum nitride thin film growth and applications for heat dissipation

(2015) Yingbin Bian et al.   SURFACE & COATINGS TECHNOLOGY

Characterization of dielectric layers grown at low temperature by atomic layer deposition

(2015) Sylwia Gieraltowska et al.   THIN SOLID FILMS

Differential 3ω method for measuring thermal conductivity of AlN and Si3N4 thin films

(2015) Manuel Bogner et al.   THIN SOLID FILMS

Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films

(2015) S. Jena et al.   THIN SOLID FILMS

Atomic layer deposition of Al2O3 and Al2O3/TiO2 barrier coatings to reduce the water vapour permeability of polyetheretherketone

(2015) Tamkin Ahmadzada et al.   THIN SOLID FILMS

Silicon nitride and intrinsic amorphous silicon double antireflection coatings for thin-film solar cells on foreign substrates

(2015) Da Li et al.   THIN SOLID FILMS

Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects

(2015) J. Muller et al.   ECS Journal of Solid State Science and Technology

AlGaN/GaN MISHEMTs with AlN gate dielectric grown by thermal ALD technique

(2015) Xiao-Yong Liu et al.   Nanoscale Research Letters

Transformational Silicon Electronics

(2014) Jhonathan Prieto Rojas et al.   ACS Nano

Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

(2014) Caroline S. Gorham et al.   APPLIED PHYSICS LETTERS

Band alignment of HfO2/Al0.25Ga0.75N determined by x-ray photoelectron spectroscopy: Effect of SiH4 surface treatment

(2014) Man Hon Samuel Owen et al.   APPLIED PHYSICS LETTERS

Pulsed laser deposition of epitaxial BeO thin films on sapphire and SrTiO3

(2014) Thomas Peltier et al.   APPLIED PHYSICS LETTERS

A non-destructive method for measuring the mechanical properties of ultrathin films prepared by atomic layer deposition

(2014) Qinglin Zhang et al.   APPLIED PHYSICS LETTERS

XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

(2014) P. Motamedi et al.   APPLIED SURFACE SCIENCE

Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes

(2014) Nasir Alimardani et al.   JOURNAL OF APPLIED PHYSICS

Influence of hydrogen content and network connectivity on the coefficient of thermal expansion and thermal stability for a-SiC:H thin films

(2014) Sean W. King et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Thermal Expansion of HfO2and ZrO2

(2014) Ryan P. Haggerty et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Recent progress in resistive random access memories: Materials, switching mechanisms, and performance

(2014) F. Pan et al.   MATERIALS SCIENCE & ENGINEERING R-REPORTS

Materials for semiconductor devices that can bend, fold, twist, and stretch

(2014) John A. Rogers   MRS BULLETIN

New materials for post-Si computing

(2014) C.W. Liu et al.   MRS BULLETIN

Measurement of In-Plane Thermal Conductivity of Ultrathin Films Using Micro-Raman Spectroscopy

(2014) Zhe Luo et al.   Nanoscale and Microscale Thermophysical Engineering

RRAMs based on anionic and cationic switching: a short overview

(2014) Sergiu Clima et al.   Physica Status Solidi-Rapid Research Letters

Thermal diffusivity and thermal conductivity of single-crystal MgO and Al2O3 and related compounds as a function of temperature

(2014) Anne M. Hofmeister   PHYSICS AND CHEMISTRY OF MINERALS

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

(2014) Matti Putkonen et al.   THIN SOLID FILMS

Emerging Applications for High K Materials in VLSI Technology

(2014) Robert Clark   Materials

Dielectric Material Options for Integrated Capacitors

(2014) Guenther Ruhl et al.   ECS Journal of Solid State Science and Technology

Dielectric Barrier, Etch Stop, and Metal Capping Materials for State of the Art and beyond Metal Interconnects

(2014) Sean W. King   ECS Journal of Solid State Science and Technology

HfO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability

(2013) Stephen McDonnell et al.   ACS Nano

High-Performance, Highly Bendable MoS2 Transistors with High-K Dielectrics for Flexible Low-Power Systems

(2013) Hsiao-Yu Chang et al.   ACS Nano

Mechanical assessment of suspended ALD thin films by bulge and shaft-loading techniques

(2013) Maria Berdova et al.   ACTA MATERIALIA

Conduction mechanisms in thin atomic layer deposited Al2O3 layers

(2013) Holger Spahr et al.   JOURNAL OF APPLIED PHYSICS

Leakage current in high dielectric oxides: Role of defect-induced energies

(2013) P. Maleeswaran et al.   JOURNAL OF APPLIED PHYSICS

Thermal conductivity of bulk and nanowire InAs, AlN, and BeO polymorphs from first principles

(2013) Wu Li et al.   JOURNAL OF APPLIED PHYSICS

Characterization of ALD Beryllium Oxide as a Potential High-k Gate Dielectric for Low-Leakage AlGaN/GaN MOSHEMTs

(2013) Derek W. Johnson et al.   JOURNAL OF ELECTRONIC MATERIALS

Detection of surface electronic defect states in low and high-k dielectrics using reflection electron energy loss spectroscopy

(2013) Benjamin L. French et al.   JOURNAL OF MATERIALS RESEARCH

Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC:H thin films

(2013) Sean W. King et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition

(2013) G. Sánchez et al.   SURFACE & COATINGS TECHNOLOGY

Interface engineering and chemistry of Hf-based high-k dielectrics on III–V substrates

(2013) Gang He et al.   SURFACE SCIENCE REPORTS

High reliability of vanadyl-phthalocyanine thin-film transistors using silicon nitride gate insulator

(2013) Lijuan Wang et al.   THIN SOLID FILMS

Aluminium oxide barrier films on polymeric web and their conversion for packaging applications

(2013) C.F. Struller et al.   THIN SOLID FILMS

Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

(2013) Terhi Hirvikorpi et al.   THIN SOLID FILMS

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

(2013) Oili M.E. Ylivaara et al.   THIN SOLID FILMS

Anisotropic thermal conductivity of thin polycrystalline oxide samples

(2013) A. Tiwari et al.   AIP Advances

Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies

(2013) Sean W. King et al.   APL Materials

Nanoengineering Strategies for Metal–Insulator–Metal Electrostatic Nanocapacitors

(2012) Lauren C. Haspert et al.   ACS Nano

Spectroscopic evaluation of band alignment of atomic layer deposited BeO on Si(100)

(2012) Ming Lei et al.   APPLIED PHYSICS LETTERS

Electron band alignment at the interface of (100)InSb with atomic-layer deposited Al2O3

(2012) H.-Y. Chou et al.   APPLIED PHYSICS LETTERS

Significant increase in conduction band discontinuity due to solid phase epitaxy of Al2O3 gate insulator films on GaN semiconductor

(2012) S. Toyoda et al.   APPLIED PHYSICS LETTERS

Structural-dependent thermal conductivity of aluminium nitride produced by reactive direct current magnetron sputtering

(2012) B. E. Belkerk et al.   APPLIED PHYSICS LETTERS

A comparison of the mechanical stability of silicon nitride films deposited with various techniques

(2012) Pierre Morin et al.   APPLIED SURFACE SCIENCE

Validation of a correction procedure for removing the optical effects from transmission spectra of thin films on substrates

(2012) Milan Milosevic et al.   JOURNAL OF APPLIED PHYSICS

A method to extract absorption coefficient of thin films from transmission spectra of the films on thick substrates

(2012) Sean W. King et al.   JOURNAL OF APPLIED PHYSICS

Comparative band alignment of plasma-enhanced atomic layer deposited high-k dielectrics on gallium nitride

(2012) Jialing Yang et al.   JOURNAL OF APPLIED PHYSICS

Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition

(2012) Mustafa Alevli et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor

(2012) Stephen E. Potts et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(2012) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Time dependent dielectric breakdown physics – Models revisited

(2012) J.W. McPherson   MICROELECTRONICS RELIABILITY

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Nanoelectromechanical contact switches

(2012) Owen Y. Loh et al.   Nature Nanotechnology

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

(2012) J A van Delft et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Valence Band Offset at a-B:H and a-BP:H/Si Interfaces

(2012) S. W. King et al.   ECS Journal of Solid State Science and Technology

Film Property Requirements for Hermetic Low-k a-SiOxCyNz:H Dielectric Barriers

(2012) S. W. King et al.   ECS Journal of Solid State Science and Technology

Growth, Structure, and Thermal Conductivity of Yttria-Stabilized Hafnia Thin Films

(2011) C.V. Ramana et al.   ACS Applied Materials & Interfaces

Inversion type InP metal oxide semiconductor field effect transistor using novel atomic layer deposited BeO gate dielectric

(2011) J. H. Yum et al.   APPLIED PHYSICS LETTERS

Epitaxial ALD BeO: Efficient Oxygen Diffusion Barrier for EOT Scaling and Reliability Improvement

(2011) Jung Hwan Yum et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Thermal conductivity and refractive index of hafnia-alumina nanolaminates

(2011) Nicholas T. Gabriel et al.   JOURNAL OF APPLIED PHYSICS

Molecular dynamics studies of the bonding properties of amorphous silicon nitride coatings on crystalline silicon

(2011) Keith T. Butler et al.   JOURNAL OF APPLIED PHYSICS

Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films

(2011) D. K. Venkatachalam et al.   JOURNAL OF APPLIED PHYSICS

Interaction potential for aluminum nitride: A molecular dynamics study of mechanical and thermal properties of crystalline and amorphous aluminum nitride

(2011) Priya Vashishta et al.   JOURNAL OF APPLIED PHYSICS

Atomic layer deposited beryllium oxide: Effective passivation layer for III-V metal/oxide/semiconductor devices

(2011) J. H. Yum et al.   JOURNAL OF APPLIED PHYSICS

A study of highly crystalline novel beryllium oxide film using atomic layer deposition

(2011) J.H. Yum et al.   JOURNAL OF CRYSTAL GROWTH

Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films

(2011) S.W. King et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy

(2011) S.W. King et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Dielectric, ferroelectric, magnetic and magnetoelectric properties of PMN-PT based ME composites

(2011) Arif D. Sheikh et al.   JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS

Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering

(2011) C Duquenne et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma enhanced atomic layer deposition of SiNx:H and SiO2

(2011) Sean W. King   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Mechanical response of atomic layer deposition alumina coatings on stiff and compliant substrates

(2011) Steve J. Bull   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks

(2011) W. Keuning et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

(2011) Alexander Perros et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

MIM in 3D: Dream or reality? (invited)

(2011) J.H. Klootwijk et al.   MICROELECTRONIC ENGINEERING

Electrical and physical characteristics for crystalline atomic layer deposited beryllium oxide thin film on Si and GaAs substrates

(2011) J.H. Yum et al.   THIN SOLID FILMS

Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition

(2011) Cagla Ozgit et al.   THIN SOLID FILMS

Limitations of Poole–Frenkel Conduction in Bilayer $\hbox{HfO}_{2}/\hbox{SiO}_{2}$ MOS Devices

(2010) Richard G. Southwick et al.   IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

Resonant characteristics of ultranarrow SiCN nanomechanical resonators

(2010) Csaba Guthy et al.   JOURNAL OF APPLIED PHYSICS

Young’s modulus and density measurements of thin atomic layer deposited films using resonant nanomechanics

(2010) B. Ilic et al.   JOURNAL OF APPLIED PHYSICS

Electronic and optical properties of Al2O3/SiO2thin films grown on Si substrate

(2010) Dahlang Tahir et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

(2010) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Microstructure and stress in high-k Hf–Y–O thin films

(2010) J. Gluch et al.   MICROELECTRONIC ENGINEERING

Energy dissipation and transport in nanoscale devices

(2010) Eric Pop   Nano Research

Berkovich Nanoindentation on AlN Thin Films

(2010) Sheng-Rui Jian et al.   Nanoscale Research Letters

Atomistic models of hydrogenated amorphous silicon nitride from first principles

(2010) K. Jarolimek et al.   PHYSICAL REVIEW B

Thermal conductivity of beryllium oxide ceramic

(2010) G. P. Akishin et al.   REFRACTORIES AND INDUSTRIAL CERAMICS

Thermo-mechanical properties of alumina films created using the atomic layer deposition technique

(2010) David C. Miller et al.   SENSORS AND ACTUATORS A-PHYSICAL

Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiNx:H films

(2010) Sean King et al.   THIN SOLID FILMS

Thermal Properties of Ultrathin Hafnium Oxide Gate Dielectric Films

(2009) M.A. Panzer et al.   IEEE ELECTRON DEVICE LETTERS

Reliability Challenges for CMOS Technology Qualifications With Hafnium Oxide/Titanium Nitride Gate Stacks

(2009) A. Kerber et al.   IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

Thermal conductivity of cubic and hexagonal mesoporous silica thin films

(2009) Thomas Coquil et al.   JOURNAL OF APPLIED PHYSICS

Challenges of integration of high-κ dielectric with III–V materials (Invited Paper)

(2009) W. Tsai et al.   MICROELECTRONIC ENGINEERING

PECVD low-permittivity organosilicate glass coatings: Adhesion, fracture and mechanical properties

(2008) Youbo Lin et al.   ACTA MATERIALIA

Energy-band alignments of HfO2 on p-GaAs substrates

(2008) Goutam Kumar Dalapati et al.   APPLIED PHYSICS LETTERS

High resolution vacuum scanning thermal microscopy of HfO2 and SiO2

(2008) M. Hinz et al.   APPLIED PHYSICS LETTERS

Complete thin film mechanical characterization using picosecond ultrasonics and nanostructured transducers: experimental demonstration on SiO2

(2008) P. A. Mante et al.   APPLIED PHYSICS LETTERS

Nanoindentation Investigation of HfO[sub 2] and Al[sub 2]O[sub 3] Films Grown by Atomic Layer Deposition

(2008) K. Tapily et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

High etch selectivity for plasma etching SiO2 with AlN and Al2O3 masks

(2008) K. Kolari   MICROELECTRONIC ENGINEERING

Micromachined resonators of high Q-factor based on atomic layer deposited alumina

(2008) Yuan-Jen Chang et al.   SENSORS AND ACTUATORS A-PHYSICAL

Celebrating the 100th anniversary of the Stoney equation for film stress: Developments from polycrystalline steel strips to single crystal silicon wafers

(2008) G.C.A.M. Janssen et al.   THIN SOLID FILMS

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS

Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

(2007) C. Cibert et al.   THIN SOLID FILMS