Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films

(2011) H. B. Profijt et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

(2011) H. B. Profijt et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films

(2011) M. E. Donders et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Modeling and experimental study of molecular nitrogen dissociation in an Ar–N2ICP discharge

(2011) Namjun Kang et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Remote Plasma ALD of SrTiO[sub 3] Using Cyclopentadienlyl-Based Ti and Sr Precursors

(2010) E. Langereis et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO[sub 2] Thin Films

(2010) Hyungchul Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low pressure hydrogen discharges diluted with argon explored using a global model

(2010) A T Hjartarson et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Accurate control of ion bombardment in remote plasmas using pulse-shaped biasing

(2009) P. Kudlacek et al.   JOURNAL OF APPLIED PHYSICS

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

(2009) A. J. M. Mackus et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode

(2008) D. Gahan et al.   REVIEW OF SCIENTIFIC INSTRUMENTS