Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition

Published 2013 View Full Article

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Title
Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 256, Issue -, Pages 3-8
Publisher
Elsevier BV
Online
2013-11-05
DOI
10.1016/j.surfcoat.2013.10.067

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