Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability

Published 2016 View Full Article

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Title
Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability
Authors
Keywords
Low-, k, Interconnect, Band diagram, XPS, EPR, Magnetic resonance
Journal
MICROELECTRONICS RELIABILITY
Volume 63, Issue -, Pages 201-213
Publisher
Elsevier BV
Online
2016-05-07
DOI
10.1016/j.microrel.2016.04.004

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