标题
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 29, Issue 5, Pages 050801
出版商
American Vacuum Society
发表日期
2011-08-19
DOI
10.1116/1.3609974
参考文献
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Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
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