Interface Properties of Nickel-silicide Films Deposited by UsingPlasma-assisted Atomic Layer Deposition

Published 2009 View Full Article

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Title
Interface Properties of Nickel-silicide Films Deposited by UsingPlasma-assisted Atomic Layer Deposition
Authors
Keywords
-
Journal
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 55, Issue 3(1), Pages 1153-1157
Publisher
Korean Physical Society
Online
2009-09-18
DOI
10.3938/jkps.55.1153

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