Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N[sub 2] and N[sub 2]O Plasma Post-Treatments

Title
Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N[sub 2] and N[sub 2]O Plasma Post-Treatments
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 12, Pages G299
Publisher
The Electrochemical Society
Online
2008-10-29
DOI
10.1149/1.2990702

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